XPS study of nitrogen-implanted ZnO thin films obtained by DC-Magnetron reactive plasma

Nouar Tabet, M. Faiz, A. Al-Oteibi

Research output: Contribution to journalArticle

70 Citations (Scopus)

Abstract

We have synthesized pure and N-doped ZnO films by reactive plasma in a DC-Magnetron sputtering system. Nitrogen was implanted by using an ion gun attached to an electron spectrometer. The films were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), and scanning electron microscopy (SEM) to investigate their composition and microstructure. XPS revealed the presence of two well-resolved peaks in N 1s spectra at about 396.2 and 404.3 eV. The peak at 404.3 eV has been assigned to zinc nitrite while the peak at 396.2 eV to zinc nitride. After annealing the sample at 250 °C in air for 1 h, one single peak, located at 399.1 eV, was observed. We suggest that this is due to the decomposition of nitrite and the formation of oxynitride.

Original languageEnglish
Pages (from-to)15-18
Number of pages4
JournalJournal of Electron Spectroscopy and Related Phenomena
Volume163
Issue number1-3
DOIs
Publication statusPublished - 1 Apr 2008
Externally publishedYes

Fingerprint

Nitrites
Zinc
Nitrogen
X ray photoelectron spectroscopy
direct current
photoelectron spectroscopy
Plasmas
nitrogen
Thin films
nitrites
Ion sources
thin films
Nitrides
Magnetron sputtering
Spectrometers
x rays
zinc
Annealing
Decomposition
X ray diffraction

Keywords

  • DC sputtering
  • Nitrogen doping
  • XPS
  • ZnO thin films

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Spectroscopy
  • Atomic and Molecular Physics, and Optics
  • Surfaces and Interfaces

Cite this

XPS study of nitrogen-implanted ZnO thin films obtained by DC-Magnetron reactive plasma. / Tabet, Nouar; Faiz, M.; Al-Oteibi, A.

In: Journal of Electron Spectroscopy and Related Phenomena, Vol. 163, No. 1-3, 01.04.2008, p. 15-18.

Research output: Contribution to journalArticle

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AB - We have synthesized pure and N-doped ZnO films by reactive plasma in a DC-Magnetron sputtering system. Nitrogen was implanted by using an ion gun attached to an electron spectrometer. The films were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), and scanning electron microscopy (SEM) to investigate their composition and microstructure. XPS revealed the presence of two well-resolved peaks in N 1s spectra at about 396.2 and 404.3 eV. The peak at 404.3 eV has been assigned to zinc nitrite while the peak at 396.2 eV to zinc nitride. After annealing the sample at 250 °C in air for 1 h, one single peak, located at 399.1 eV, was observed. We suggest that this is due to the decomposition of nitrite and the formation of oxynitride.

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