Thin photo-patterned micropolarizer array for CMOS image sensors

Xiaojin Zhao, Farid Boussaid, Amine Bermak, Vladimir G. Chigrinov

Research output: Contribution to journalArticle

66 Citations (Scopus)


We fabricated and characterized a thin photo-patterned micropolarizer array for complementary metal-oxide-semiconductor (CMOS) image sensors. The proposed micropolarizer fabrication technology completely removes the need for complex selective etching. Instead, it uses the well-controlled process of ultraviolet photolithography to define micropolarizer orientation patterns on a spin-coated azo-dye-1 film. The patterned polymer film micropolarizer (10 μm × 10 μm) exhibits submicron thickness (0.3 μm) and has an extinction ratio of ∼100. Reported experimental results validate the concept of a thin, high spatial resolution, low-cost photo-patterned micropolarizer array for CMOS image sensors.

Original languageEnglish
Pages (from-to)805-807
Number of pages3
JournalIEEE Photonics Technology Letters
Issue number12
Publication statusPublished - 15 Jun 2009



  • Arrays
  • CMOS image sensors
  • CMOS integrated circuits
  • Complementary metal-oxide-semiconductor (CMOS) image sensor
  • Fabrication
  • Glass
  • Micropolarizer array
  • Polarization imaging
  • Sensors
  • Substrates

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

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