Thermal dissolution of aluminum oxide layers on tungsten and molybdenum 〈111〉 and on tungsten {110} in the presence of electric fields

L. R. Pederson, R. Vanselow

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    Abstract

    Aluminum oxide layer dissolution was studied in the area of W〈111〉, Mo〈111〉 and on W{110} by means of FEM. Activation energies were measured between 700 and 1200 K as a function of the electric field strength (-45 to + 105 MV/cm). At lower fields the layer molecules move over an activation barrier E0 into a diffusion layer (E0F = E00 + Δμ F; W〈111〉, E00 = 1.5 eV and Δμ = 3.0 D; Mo〈111〉, E00 = 1.0 eV and Δμ = 2.7 D; E0F = E00 - Δμ F; W{110}, E00 = 3.2 eV), At higher fields singly charged positive ions are emitted over a reduced Schottky barrier (E+F =E+0 - n 3 2e 3 2F 1 2; W〈111〉, e+0 = 5.0 eV; Mo〈111〉,E+0 = 4.5 eV; W{110}, 0 = 5.1 eV). It is assumed that aluminum suboxides - preferentially AlO - are involved in the dissolution process.

    Original languageEnglish
    Pages (from-to)553-564
    Number of pages12
    JournalSurface Science
    Volume135
    Issue number1-3
    DOIs
    Publication statusPublished - 2 Dec 1983

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    ASJC Scopus subject areas

    • Condensed Matter Physics
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films
    • Materials Chemistry

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