Thermal dissolution of aluminum oxide layers on tungsten and molybdenum 〈111〉 and on tungsten {110} in the presence of electric fields

L. R. Pederson, R. Vanselow

Research output: Contribution to journalArticle

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Abstract

Aluminum oxide layer dissolution was studied in the area of W〈111〉, Mo〈111〉 and on W{110} by means of FEM. Activation energies were measured between 700 and 1200 K as a function of the electric field strength (-45 to + 105 MV/cm). At lower fields the layer molecules move over an activation barrier E0 into a diffusion layer (E0F = E00 + Δμ F; W〈111〉, E00 = 1.5 eV and Δμ = 3.0 D; Mo〈111〉, E00 = 1.0 eV and Δμ = 2.7 D; E0F = E00 - Δμ F; W{110}, E00 = 3.2 eV), At higher fields singly charged positive ions are emitted over a reduced Schottky barrier (E+F =E+0 - n 3 2e 3 2F 1 2; W〈111〉, e+0 = 5.0 eV; Mo〈111〉,E+0 = 4.5 eV; W{110}, 0 = 5.1 eV). It is assumed that aluminum suboxides - preferentially AlO - are involved in the dissolution process.

Original languageEnglish
Pages (from-to)553-564
Number of pages12
JournalSurface Science
Volume135
Issue number1-3
DOIs
Publication statusPublished - 2 Dec 1983
Externally publishedYes

Fingerprint

Tungsten
Molybdenum
Aluminum Oxide
molybdenum
dissolving
tungsten
Dissolution
aluminum oxides
Electric fields
Aluminum
Oxides
electric fields
Activation energy
Positive ions
Chemical activation
electric field strength
positive ions
Finite element method
Molecules
activation

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Thermal dissolution of aluminum oxide layers on tungsten and molybdenum 〈111〉 and on tungsten {110} in the presence of electric fields. / Pederson, L. R.; Vanselow, R.

In: Surface Science, Vol. 135, No. 1-3, 02.12.1983, p. 553-564.

Research output: Contribution to journalArticle

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abstract = "Aluminum oxide layer dissolution was studied in the area of W〈111〉, Mo〈111〉 and on W{110} by means of FEM. Activation energies were measured between 700 and 1200 K as a function of the electric field strength (-45 to + 105 MV/cm). At lower fields the layer molecules move over an activation barrier E0 into a diffusion layer (E0F = E00 + Δμ F; W〈111〉, E00 = 1.5 eV and Δμ = 3.0 D; Mo〈111〉, E00 = 1.0 eV and Δμ = 2.7 D; E0F = E00 - Δμ F; W{110}, E00 = 3.2 eV), At higher fields singly charged positive ions are emitted over a reduced Schottky barrier (E+F =E+0 - n 3 2e 3 2F 1 2; W〈111〉, e+0 = 5.0 eV; Mo〈111〉,E+0 = 4.5 eV; W{110}, 0 = 5.1 eV). It is assumed that aluminum suboxides - preferentially AlO - are involved in the dissolution process.",
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N2 - Aluminum oxide layer dissolution was studied in the area of W〈111〉, Mo〈111〉 and on W{110} by means of FEM. Activation energies were measured between 700 and 1200 K as a function of the electric field strength (-45 to + 105 MV/cm). At lower fields the layer molecules move over an activation barrier E0 into a diffusion layer (E0F = E00 + Δμ F; W〈111〉, E00 = 1.5 eV and Δμ = 3.0 D; Mo〈111〉, E00 = 1.0 eV and Δμ = 2.7 D; E0F = E00 - Δμ F; W{110}, E00 = 3.2 eV), At higher fields singly charged positive ions are emitted over a reduced Schottky barrier (E+F =E+0 - n 3 2e 3 2F 1 2; W〈111〉, e+0 = 5.0 eV; Mo〈111〉,E+0 = 4.5 eV; W{110}, 0 = 5.1 eV). It is assumed that aluminum suboxides - preferentially AlO - are involved in the dissolution process.

AB - Aluminum oxide layer dissolution was studied in the area of W〈111〉, Mo〈111〉 and on W{110} by means of FEM. Activation energies were measured between 700 and 1200 K as a function of the electric field strength (-45 to + 105 MV/cm). At lower fields the layer molecules move over an activation barrier E0 into a diffusion layer (E0F = E00 + Δμ F; W〈111〉, E00 = 1.5 eV and Δμ = 3.0 D; Mo〈111〉, E00 = 1.0 eV and Δμ = 2.7 D; E0F = E00 - Δμ F; W{110}, E00 = 3.2 eV), At higher fields singly charged positive ions are emitted over a reduced Schottky barrier (E+F =E+0 - n 3 2e 3 2F 1 2; W〈111〉, e+0 = 5.0 eV; Mo〈111〉,E+0 = 4.5 eV; W{110}, 0 = 5.1 eV). It is assumed that aluminum suboxides - preferentially AlO - are involved in the dissolution process.

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