The influence of deposits in a metal - organic chemical vapour deposition apparatus on the stability of precursors

Frank René Lang, Klaus Hermann Dahmen

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

The design and the construction of a pyrolysis mass spectrometer suitable for monitoring metal-organic chemical vapour deposition reactions is reported. The CeO2-catalysed decompositions of Hacac (where acac denotes acetylacetone), Hdpm (where dpm denotes dipivaloylmethane), Ce(acac)4 and Ce(dpm)4 were investigated using this apparatus. The temperature dependence and the inhibition of the catalytic surface (1000-3000 Å of CeO2) were also studied.

Original languageEnglish
Pages (from-to)378-382
Number of pages5
JournalThin Solid Films
Volume241
Issue number1-2
Publication statusPublished - 1 Apr 1994
Externally publishedYes

Fingerprint

Organic Chemicals
acetylacetone
Organic chemicals
Mass spectrometers
mass spectrometers
metalorganic chemical vapor deposition
pyrolysis
Chemical vapor deposition
Pyrolysis
Deposits
Metals
deposits
Decomposition
decomposition
temperature dependence
Monitoring
Temperature
dipivaloylmethane

ASJC Scopus subject areas

  • Surfaces and Interfaces
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

Cite this

The influence of deposits in a metal - organic chemical vapour deposition apparatus on the stability of precursors. / Lang, Frank René; Dahmen, Klaus Hermann.

In: Thin Solid Films, Vol. 241, No. 1-2, 01.04.1994, p. 378-382.

Research output: Contribution to journalArticle

Lang, Frank René ; Dahmen, Klaus Hermann. / The influence of deposits in a metal - organic chemical vapour deposition apparatus on the stability of precursors. In: Thin Solid Films. 1994 ; Vol. 241, No. 1-2. pp. 378-382.
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