The influence of deposits in a metal - organic chemical vapour deposition apparatus on the stability of precursors

Frank René Lang, Klaus Hermann Dahmen

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Abstract

The design and the construction of a pyrolysis mass spectrometer suitable for monitoring metal-organic chemical vapour deposition reactions is reported. The CeO2-catalysed decompositions of Hacac (where acac denotes acetylacetone), Hdpm (where dpm denotes dipivaloylmethane), Ce(acac)4 and Ce(dpm)4 were investigated using this apparatus. The temperature dependence and the inhibition of the catalytic surface (1000-3000 Å of CeO2) were also studied.

Original languageEnglish
Pages (from-to)378-382
Number of pages5
JournalThin Solid Films
Volume241
Issue number1-2
DOIs
Publication statusPublished - 1 Apr 1994

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ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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