The deposition of Pb and PbO on various substrates by MOCVD using a new trinuclear lead precursor

Roman Hedinger, Thomas Kradolfer, Kaspar Hegetschweiler, Michael Wörle, Klaus Hermann Dahmen

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

The synthesis and characterization of the trinuclear, uncharged and volatile lead(II) complex [Pb3(H_3tdci)2]·5H2O (tdci = 1,3,5-trideoxy-1,3,5-tris(dimethylamino)-cis-inositol) is described. Despite its rather high molecular weight, this compound can be used as a precursor for the deposition of thin films of lead and lead(II) oxide by metal organic chemical vapor deposition (MOCVD). Experiments were carried out under reduced pressure in a temperature range of 450-550°C, using stainless steel, copper, and copper-, silver-, and gold-coated silicon as substrates, showing a preferential deposition on conducting substrates. The nature of the deposited films was analyzed.

Original languageEnglish
Pages (from-to)29-35
Number of pages7
JournalChemical Vapor Deposition
Volume5
Issue number1
Publication statusPublished - 1 Jan 1999
Externally publishedYes

Fingerprint

Organic Chemicals
Organic chemicals
metalorganic chemical vapor deposition
Chemical vapor deposition
Lead
Metals
Copper
Substrates
inositols
copper
Stainless Steel
Silicon
Silver
Gold
Oxides
stainless steels
molecular weight
Stainless steel
Molecular weight
silver

Keywords

  • Lead
  • Lead(II) oxide
  • MOCVD
  • Polyamino-polyalcohols
  • Trinuclear precursor

ASJC Scopus subject areas

  • Process Chemistry and Technology
  • Electrochemistry
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Hedinger, R., Kradolfer, T., Hegetschweiler, K., Wörle, M., & Dahmen, K. H. (1999). The deposition of Pb and PbO on various substrates by MOCVD using a new trinuclear lead precursor. Chemical Vapor Deposition, 5(1), 29-35.

The deposition of Pb and PbO on various substrates by MOCVD using a new trinuclear lead precursor. / Hedinger, Roman; Kradolfer, Thomas; Hegetschweiler, Kaspar; Wörle, Michael; Dahmen, Klaus Hermann.

In: Chemical Vapor Deposition, Vol. 5, No. 1, 01.01.1999, p. 29-35.

Research output: Contribution to journalArticle

Hedinger, R, Kradolfer, T, Hegetschweiler, K, Wörle, M & Dahmen, KH 1999, 'The deposition of Pb and PbO on various substrates by MOCVD using a new trinuclear lead precursor', Chemical Vapor Deposition, vol. 5, no. 1, pp. 29-35.
Hedinger R, Kradolfer T, Hegetschweiler K, Wörle M, Dahmen KH. The deposition of Pb and PbO on various substrates by MOCVD using a new trinuclear lead precursor. Chemical Vapor Deposition. 1999 Jan 1;5(1):29-35.
Hedinger, Roman ; Kradolfer, Thomas ; Hegetschweiler, Kaspar ; Wörle, Michael ; Dahmen, Klaus Hermann. / The deposition of Pb and PbO on various substrates by MOCVD using a new trinuclear lead precursor. In: Chemical Vapor Deposition. 1999 ; Vol. 5, No. 1. pp. 29-35.
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