Structure of Ti1-xTaxN thin films prepared by DC-magnetron sputtering

O. Bourbia, N. Guerfi, S. Achour, Nouar Tabet, A. Mosser

Research output: Chapter in Book/Report/Conference proceedingConference contribution


X-ray photoelectron spectroscopy (XPS) and high resolution transmission electron microscopy (HRTEM) were used to investigate the effect of tantalum addition on the TiN thin films structure. Both the HRTEM and selected area electron diffraction have showed that the films possess a fine grained polycrystalline structure with an average grain size in the order of 10 nm. The chemical composition of the films was determined by the use of the Ti2p, N1s and Ta4f core level peaks. The analysis of Ta4f core level revealed the presence of Ta-N bond indicating that tantalum atoms can occupy the titanium sublattice sites. Moreover, the XPS spectra revealed the presence of Ta2O 5 in the films.

Original languageEnglish
Title of host publicationMaterials Science Forum
Number of pages6
Publication statusPublished - 1 Dec 2005
Externally publishedYes
Event1st International Meeting on Applied Physics, APHYS-2003 - Badajoz, Spain
Duration: 13 Oct 200318 Oct 2003

Publication series

NameMaterials Science Forum
ISSN (Print)02555476


Other1st International Meeting on Applied Physics, APHYS-2003



  • DC magnetron sputtering
  • Structure
  • TiTaN
  • XPS

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Bourbia, O., Guerfi, N., Achour, S., Tabet, N., & Mosser, A. (2005). Structure of Ti1-xTaxN thin films prepared by DC-magnetron sputtering. In Materials Science Forum (Vol. 480-481, pp. 387-392). (Materials Science Forum; Vol. 480-481).