Structural studies of titanium oxide films deposited with metalorganic decomposition

K. Padmanabhan, N. E. Harvey, Parashu Kurel, P. Talagala, R. Naik, G. W. Auner, V. M. Naik, R. Suryanarayanan, S. Thevuthasan, V. Shutthanandan

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Films of TiO2 were deposited using an ethyl hexoxide based metalorganic solution on sapphire substrates by employing the MOD method. Rutherford backscattering spectrometry (RBS) used for composition and thickness analysis of the films indicated that the films were stoichiometric. XRD and Raman spectroscopy showed anatase and rutile phases could be formed with appropriate annealing temperatures of 550 °C and 700 °C. 12C(d,p)C13 nuclear reaction analysis indicated the presence of residual C in the MOD films. Ion channeling analysis indicated epitaxial growth of the film on sapphire only for very thin films. Significant diffusion of Ti atoms was also observed from the channeling spectra. Preliminary magnetic measurements indicated the possibility of ferromagnetic activity in these films when doped with iron and cobalt.

Original languageEnglish
Pages (from-to)540-543
Number of pages4
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume249
Issue number1-2 SPEC. ISS.
DOIs
Publication statusPublished - Aug 2006
Externally publishedYes

Fingerprint

Titanium oxides
titanium oxides
Oxide films
oxide films
Decomposition
decomposition
Aluminum Oxide
Sapphire
sapphire
Nuclear reactions
Magnetic variables measurement
Rutherford backscattering spectroscopy
Cobalt
Epitaxial growth
nuclear reactions
anatase
rutile
Titanium dioxide
Spectrometry
spectroscopy

Keywords

  • Channeling
  • Epitaxy
  • Metalorganic decomposition
  • Thin films
  • TiO

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Instrumentation
  • Surfaces and Interfaces

Cite this

Structural studies of titanium oxide films deposited with metalorganic decomposition. / Padmanabhan, K.; Harvey, N. E.; Kurel, Parashu; Talagala, P.; Naik, R.; Auner, G. W.; Naik, V. M.; Suryanarayanan, R.; Thevuthasan, S.; Shutthanandan, V.

In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Vol. 249, No. 1-2 SPEC. ISS., 08.2006, p. 540-543.

Research output: Contribution to journalArticle

Padmanabhan, K, Harvey, NE, Kurel, P, Talagala, P, Naik, R, Auner, GW, Naik, VM, Suryanarayanan, R, Thevuthasan, S & Shutthanandan, V 2006, 'Structural studies of titanium oxide films deposited with metalorganic decomposition', Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, vol. 249, no. 1-2 SPEC. ISS., pp. 540-543. https://doi.org/10.1016/j.nimb.2006.03.048
Padmanabhan, K. ; Harvey, N. E. ; Kurel, Parashu ; Talagala, P. ; Naik, R. ; Auner, G. W. ; Naik, V. M. ; Suryanarayanan, R. ; Thevuthasan, S. ; Shutthanandan, V. / Structural studies of titanium oxide films deposited with metalorganic decomposition. In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 2006 ; Vol. 249, No. 1-2 SPEC. ISS. pp. 540-543.
@article{77913429380e4a3a83140fe4ea320588,
title = "Structural studies of titanium oxide films deposited with metalorganic decomposition",
abstract = "Films of TiO2 were deposited using an ethyl hexoxide based metalorganic solution on sapphire substrates by employing the MOD method. Rutherford backscattering spectrometry (RBS) used for composition and thickness analysis of the films indicated that the films were stoichiometric. XRD and Raman spectroscopy showed anatase and rutile phases could be formed with appropriate annealing temperatures of 550 °C and 700 °C. 12C(d,p)C13 nuclear reaction analysis indicated the presence of residual C in the MOD films. Ion channeling analysis indicated epitaxial growth of the film on sapphire only for very thin films. Significant diffusion of Ti atoms was also observed from the channeling spectra. Preliminary magnetic measurements indicated the possibility of ferromagnetic activity in these films when doped with iron and cobalt.",
keywords = "Channeling, Epitaxy, Metalorganic decomposition, Thin films, TiO",
author = "K. Padmanabhan and Harvey, {N. E.} and Parashu Kurel and P. Talagala and R. Naik and Auner, {G. W.} and Naik, {V. M.} and R. Suryanarayanan and S. Thevuthasan and V. Shutthanandan",
year = "2006",
month = "8",
doi = "10.1016/j.nimb.2006.03.048",
language = "English",
volume = "249",
pages = "540--543",
journal = "Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms",
issn = "0168-583X",
publisher = "Elsevier",
number = "1-2 SPEC. ISS.",

}

TY - JOUR

T1 - Structural studies of titanium oxide films deposited with metalorganic decomposition

AU - Padmanabhan, K.

AU - Harvey, N. E.

AU - Kurel, Parashu

AU - Talagala, P.

AU - Naik, R.

AU - Auner, G. W.

AU - Naik, V. M.

AU - Suryanarayanan, R.

AU - Thevuthasan, S.

AU - Shutthanandan, V.

PY - 2006/8

Y1 - 2006/8

N2 - Films of TiO2 were deposited using an ethyl hexoxide based metalorganic solution on sapphire substrates by employing the MOD method. Rutherford backscattering spectrometry (RBS) used for composition and thickness analysis of the films indicated that the films were stoichiometric. XRD and Raman spectroscopy showed anatase and rutile phases could be formed with appropriate annealing temperatures of 550 °C and 700 °C. 12C(d,p)C13 nuclear reaction analysis indicated the presence of residual C in the MOD films. Ion channeling analysis indicated epitaxial growth of the film on sapphire only for very thin films. Significant diffusion of Ti atoms was also observed from the channeling spectra. Preliminary magnetic measurements indicated the possibility of ferromagnetic activity in these films when doped with iron and cobalt.

AB - Films of TiO2 were deposited using an ethyl hexoxide based metalorganic solution on sapphire substrates by employing the MOD method. Rutherford backscattering spectrometry (RBS) used for composition and thickness analysis of the films indicated that the films were stoichiometric. XRD and Raman spectroscopy showed anatase and rutile phases could be formed with appropriate annealing temperatures of 550 °C and 700 °C. 12C(d,p)C13 nuclear reaction analysis indicated the presence of residual C in the MOD films. Ion channeling analysis indicated epitaxial growth of the film on sapphire only for very thin films. Significant diffusion of Ti atoms was also observed from the channeling spectra. Preliminary magnetic measurements indicated the possibility of ferromagnetic activity in these films when doped with iron and cobalt.

KW - Channeling

KW - Epitaxy

KW - Metalorganic decomposition

KW - Thin films

KW - TiO

UR - http://www.scopus.com/inward/record.url?scp=33745867292&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33745867292&partnerID=8YFLogxK

U2 - 10.1016/j.nimb.2006.03.048

DO - 10.1016/j.nimb.2006.03.048

M3 - Article

VL - 249

SP - 540

EP - 543

JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

SN - 0168-583X

IS - 1-2 SPEC. ISS.

ER -