Structural, electrical and optical studies of SILAR deposited cadmium oxide thin films: Annealing effect

R. R. Salunkhe, Dattatray Dhawale, T. P. Gujar, C. D. Lokhande

Research output: Contribution to journalArticle

49 Citations (Scopus)

Abstract

Successive ionic layer adsorption and reaction (SILAR) method has been successfully employed for the deposition of cadmium oxide (CdO) thin films. The films were annealed at 623 K for 2 h in an air and changes in the structural, electrical and optical properties were studied. From the X-ray diffraction patterns, it was found that after annealing, H2O vapors from as-deposited Cd(O2)0.88(OH)0.24 were removed and pure cubic cadmium oxide was obtained. The as-deposited film consists of nanocrystalline grains of average diameter about 20-30 nm with uniform coverage of the substrate surface, whereas for the annealed film randomly oriented morphology with slight increase in the crystallite size has been observed. The electrical resistivity showed the semiconducting nature with room temperature electrical resistivity decreased from 10-2 to 10-3 Ω cm after annealing. The decrease in the band gap energy from 3.3 to 2.7 eV was observed after the annealing.

Original languageEnglish
Pages (from-to)364-368
Number of pages5
JournalMaterials Research Bulletin
Volume44
Issue number2
DOIs
Publication statusPublished - 4 Feb 2009
Externally publishedYes

Fingerprint

Cadmium
cadmium
Oxide films
Annealing
Adsorption
Thin films
annealing
adsorption
oxides
thin films
electrical resistivity
Crystallite size
Diffraction patterns
Structural properties
Electric properties
Energy gap
diffraction patterns
Optical properties
Vapors
electrical properties

Keywords

  • A. Nanostructures
  • A. Thin films
  • B. Chemical synthesis
  • D. Electrical properties
  • D. Optical properties

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering
  • Mechanics of Materials

Cite this

Structural, electrical and optical studies of SILAR deposited cadmium oxide thin films : Annealing effect. / Salunkhe, R. R.; Dhawale, Dattatray; Gujar, T. P.; Lokhande, C. D.

In: Materials Research Bulletin, Vol. 44, No. 2, 04.02.2009, p. 364-368.

Research output: Contribution to journalArticle

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