Photoelectron-diffraction and photoelectron-holography study of a Ge(111) high-temperature surface phase transition

T. T. Tran, S. Thevuthasan, Y. J. Kim, G. S. Herman, D. J. Friedman, C. S. Fadley

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

Further evidence for a reversible surface-disordering phase transition on Ge(111) occurring 150 K below the bulk melting point of 1210 K has been found using Ge 3p x-ray photoelectron diffraction (XPD). Azimuthal XPD data at takeoff angles of =19°(including nearest-neighbor forward-scattering directions and yielding high surface sensitivity) and =55°(for which second-nearest- neighbor scattering directions and more bulk sensitivity are involved) show abrupt decreases in intensity of 40% and 30%, respectively, over the interval of 900-1200 K. Photoelectron holograms and holographic images of near-neighbor atoms at temperatures above and below the phase transition indicate an identical near-neighbor structure for all atoms present in ordered sites. These combined diffraction and holography data indicate that by 1200 K the top 1-2 double layers of Ge atoms are completely disordered.

Original languageEnglish
Pages (from-to)12106-12109
Number of pages4
JournalPhysical Review B
Volume45
Issue number20
DOIs
Publication statusPublished - 1992
Externally publishedYes

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Holography
Photoelectrons
holography
photoelectrons
Diffraction
Phase transitions
Atoms
diffraction
atoms
Forward scattering
X rays
takeoff
Takeoff
forward scattering
Holograms
Temperature
melting points
Melting point
x rays
Scattering

ASJC Scopus subject areas

  • Condensed Matter Physics

Cite this

Tran, T. T., Thevuthasan, S., Kim, Y. J., Herman, G. S., Friedman, D. J., & Fadley, C. S. (1992). Photoelectron-diffraction and photoelectron-holography study of a Ge(111) high-temperature surface phase transition. Physical Review B, 45(20), 12106-12109. https://doi.org/10.1103/PhysRevB.45.12106

Photoelectron-diffraction and photoelectron-holography study of a Ge(111) high-temperature surface phase transition. / Tran, T. T.; Thevuthasan, S.; Kim, Y. J.; Herman, G. S.; Friedman, D. J.; Fadley, C. S.

In: Physical Review B, Vol. 45, No. 20, 1992, p. 12106-12109.

Research output: Contribution to journalArticle

Tran, TT, Thevuthasan, S, Kim, YJ, Herman, GS, Friedman, DJ & Fadley, CS 1992, 'Photoelectron-diffraction and photoelectron-holography study of a Ge(111) high-temperature surface phase transition', Physical Review B, vol. 45, no. 20, pp. 12106-12109. https://doi.org/10.1103/PhysRevB.45.12106
Tran, T. T. ; Thevuthasan, S. ; Kim, Y. J. ; Herman, G. S. ; Friedman, D. J. ; Fadley, C. S. / Photoelectron-diffraction and photoelectron-holography study of a Ge(111) high-temperature surface phase transition. In: Physical Review B. 1992 ; Vol. 45, No. 20. pp. 12106-12109.
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