Photochemical degradation of vinyl chloride with an Advanced Reduction Process (ARP) - Effects of reagents and pH

Xu Liu, Sunhee Yoon, Bill Batchelor, Ahmed Abdel-Wahab

Research output: Contribution to journalArticle

33 Citations (Scopus)

Abstract

A new treatment technology, called an Advanced Reduction Process (ARP), was developed by combining UV irradiation with reducing reagents to produce highly reactive reducing free radicals that degrade contaminants. Batch experiments were performed under anaerobic conditions to investigate the degradation of vinyl chloride (VC) by this ARP. All degradation reactions were found to follow a pseudo-first-order decay model and the rate constants (kobs) were characterized for all experimental conditions. The influence of pH on kobs was studied in experiments with direct photolysis as well as experiments with ARPs using reagents activated by ultraviolet (UV) light. Values for kobs in direct photolysis were found to be 0.012, 0.011, and 0.018min-1 at pH 3, 7 and 10, respectively. Values of most of the kobs in experiments with ARP increased at all pH values compared with corresponding values obtained for direct photolysis. The increase in kobs was due to the production of reactive species produced by photochemical reaction of the reducing reagents with UV light. The pH effect on kobs observed with the ARP can be explained in terms of changes in the absorption spectra of the reagents at various pH. The rate of light absorption determines the rate of formation of the reactive species which determines the rate of contaminant degradation. Chloride ion and chloroethane were detected as the products of VC degradation. The increase in pH value was shown to promote the transformation of VC to chloride.

Original languageEnglish
Pages (from-to)868-875
Number of pages8
JournalChemical Engineering Journal
Volume215-216
DOIs
Publication statusPublished - 5 Jan 2013
Externally publishedYes

Fingerprint

Vinyl Chloride
Photolysis
chloride
Degradation
photolysis
degradation
Chlorides
Ethyl Chloride
Experiments
Impurities
pH effects
experiment
Photochemical reactions
Free radicals
Light absorption
pollutant
Free Radicals
Absorption spectra
absorption spectrum
free radical

Keywords

  • Free radicals
  • PH effect
  • Photochemical degradation
  • UV irradiation
  • Vinyl chloride

ASJC Scopus subject areas

  • Chemistry(all)
  • Environmental Chemistry
  • Chemical Engineering(all)
  • Industrial and Manufacturing Engineering

Cite this

Photochemical degradation of vinyl chloride with an Advanced Reduction Process (ARP) - Effects of reagents and pH. / Liu, Xu; Yoon, Sunhee; Batchelor, Bill; Abdel-Wahab, Ahmed.

In: Chemical Engineering Journal, Vol. 215-216, 05.01.2013, p. 868-875.

Research output: Contribution to journalArticle

@article{5269e908d2f84cbc9b2bf6efe56a1e23,
title = "Photochemical degradation of vinyl chloride with an Advanced Reduction Process (ARP) - Effects of reagents and pH",
abstract = "A new treatment technology, called an Advanced Reduction Process (ARP), was developed by combining UV irradiation with reducing reagents to produce highly reactive reducing free radicals that degrade contaminants. Batch experiments were performed under anaerobic conditions to investigate the degradation of vinyl chloride (VC) by this ARP. All degradation reactions were found to follow a pseudo-first-order decay model and the rate constants (kobs) were characterized for all experimental conditions. The influence of pH on kobs was studied in experiments with direct photolysis as well as experiments with ARPs using reagents activated by ultraviolet (UV) light. Values for kobs in direct photolysis were found to be 0.012, 0.011, and 0.018min-1 at pH 3, 7 and 10, respectively. Values of most of the kobs in experiments with ARP increased at all pH values compared with corresponding values obtained for direct photolysis. The increase in kobs was due to the production of reactive species produced by photochemical reaction of the reducing reagents with UV light. The pH effect on kobs observed with the ARP can be explained in terms of changes in the absorption spectra of the reagents at various pH. The rate of light absorption determines the rate of formation of the reactive species which determines the rate of contaminant degradation. Chloride ion and chloroethane were detected as the products of VC degradation. The increase in pH value was shown to promote the transformation of VC to chloride.",
keywords = "Free radicals, PH effect, Photochemical degradation, UV irradiation, Vinyl chloride",
author = "Xu Liu and Sunhee Yoon and Bill Batchelor and Ahmed Abdel-Wahab",
year = "2013",
month = "1",
day = "5",
doi = "10.1016/j.cej.2012.11.086",
language = "English",
volume = "215-216",
pages = "868--875",
journal = "Chemical Engineering Journal",
issn = "1385-8947",
publisher = "Elsevier",

}

TY - JOUR

T1 - Photochemical degradation of vinyl chloride with an Advanced Reduction Process (ARP) - Effects of reagents and pH

AU - Liu, Xu

AU - Yoon, Sunhee

AU - Batchelor, Bill

AU - Abdel-Wahab, Ahmed

PY - 2013/1/5

Y1 - 2013/1/5

N2 - A new treatment technology, called an Advanced Reduction Process (ARP), was developed by combining UV irradiation with reducing reagents to produce highly reactive reducing free radicals that degrade contaminants. Batch experiments were performed under anaerobic conditions to investigate the degradation of vinyl chloride (VC) by this ARP. All degradation reactions were found to follow a pseudo-first-order decay model and the rate constants (kobs) were characterized for all experimental conditions. The influence of pH on kobs was studied in experiments with direct photolysis as well as experiments with ARPs using reagents activated by ultraviolet (UV) light. Values for kobs in direct photolysis were found to be 0.012, 0.011, and 0.018min-1 at pH 3, 7 and 10, respectively. Values of most of the kobs in experiments with ARP increased at all pH values compared with corresponding values obtained for direct photolysis. The increase in kobs was due to the production of reactive species produced by photochemical reaction of the reducing reagents with UV light. The pH effect on kobs observed with the ARP can be explained in terms of changes in the absorption spectra of the reagents at various pH. The rate of light absorption determines the rate of formation of the reactive species which determines the rate of contaminant degradation. Chloride ion and chloroethane were detected as the products of VC degradation. The increase in pH value was shown to promote the transformation of VC to chloride.

AB - A new treatment technology, called an Advanced Reduction Process (ARP), was developed by combining UV irradiation with reducing reagents to produce highly reactive reducing free radicals that degrade contaminants. Batch experiments were performed under anaerobic conditions to investigate the degradation of vinyl chloride (VC) by this ARP. All degradation reactions were found to follow a pseudo-first-order decay model and the rate constants (kobs) were characterized for all experimental conditions. The influence of pH on kobs was studied in experiments with direct photolysis as well as experiments with ARPs using reagents activated by ultraviolet (UV) light. Values for kobs in direct photolysis were found to be 0.012, 0.011, and 0.018min-1 at pH 3, 7 and 10, respectively. Values of most of the kobs in experiments with ARP increased at all pH values compared with corresponding values obtained for direct photolysis. The increase in kobs was due to the production of reactive species produced by photochemical reaction of the reducing reagents with UV light. The pH effect on kobs observed with the ARP can be explained in terms of changes in the absorption spectra of the reagents at various pH. The rate of light absorption determines the rate of formation of the reactive species which determines the rate of contaminant degradation. Chloride ion and chloroethane were detected as the products of VC degradation. The increase in pH value was shown to promote the transformation of VC to chloride.

KW - Free radicals

KW - PH effect

KW - Photochemical degradation

KW - UV irradiation

KW - Vinyl chloride

UR - http://www.scopus.com/inward/record.url?scp=84870799060&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84870799060&partnerID=8YFLogxK

U2 - 10.1016/j.cej.2012.11.086

DO - 10.1016/j.cej.2012.11.086

M3 - Article

VL - 215-216

SP - 868

EP - 875

JO - Chemical Engineering Journal

JF - Chemical Engineering Journal

SN - 1385-8947

ER -