On the existence of superstructure in TiNx thin films

S. Zerkout, S. Achour, A. Mosser, N. Tabet

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25 Citations (Scopus)


Titanium nitride films deposited on NaCl single crystal substrates were prepared using reactive d.c. magnetron sputtering under deposition conditions yielding near stoichiometric films. Several large areas (φ≈20 nm) of superstructure were formed by annealing these films under vacuum at 873 K for 30 min. The existence of a superstructure was observed by high resolution transmission electron microscopy (HRTEM) in thin films which were annealed at 873 K. Only the normal structure was observed below this temperature.

Original languageEnglish
Pages (from-to)135-139
Number of pages5
JournalThin Solid Films
Issue number1-2
Publication statusPublished - 22 Sep 2003



  • Annealing
  • Superstructure
  • TiN
  • TiN
  • XPS

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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