On the existence of superstructure in TiNx thin films

S. Zerkout, S. Achour, A. Mosser, Nouar Tabet

Research output: Contribution to journalArticle

25 Citations (Scopus)

Abstract

Titanium nitride films deposited on NaCl single crystal substrates were prepared using reactive d.c. magnetron sputtering under deposition conditions yielding near stoichiometric films. Several large areas (φ≈20 nm) of superstructure were formed by annealing these films under vacuum at 873 K for 30 min. The existence of a superstructure was observed by high resolution transmission electron microscopy (HRTEM) in thin films which were annealed at 873 K. Only the normal structure was observed below this temperature.

Original languageEnglish
Pages (from-to)135-139
Number of pages5
JournalThin Solid Films
Volume441
Issue number1-2
DOIs
Publication statusPublished - 22 Sep 2003
Externally publishedYes

Fingerprint

Thin films
thin films
Titanium nitride
titanium nitrides
Reactive sputtering
High resolution transmission electron microscopy
Magnetron sputtering
magnetron sputtering
Single crystals
Vacuum
Annealing
vacuum
transmission electron microscopy
annealing
high resolution
single crystals
Substrates
Temperature
temperature
titanium nitride

Keywords

  • Annealing
  • HRTEM
  • Superstructure
  • TiN
  • TiN
  • XPS

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

On the existence of superstructure in TiNx thin films. / Zerkout, S.; Achour, S.; Mosser, A.; Tabet, Nouar.

In: Thin Solid Films, Vol. 441, No. 1-2, 22.09.2003, p. 135-139.

Research output: Contribution to journalArticle

Zerkout, S. ; Achour, S. ; Mosser, A. ; Tabet, Nouar. / On the existence of superstructure in TiNx thin films. In: Thin Solid Films. 2003 ; Vol. 441, No. 1-2. pp. 135-139.
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