Negative charge emission due to excimer laser bombardment of sodium trisilicate glass

S. C. Langford, L. C. Jensen, J. T. Dickinson, L. R. Pederson

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    Abstract

    We describe measurements of negative charge emission accompanying irradiation of sodium trisilicate glass (Na2O·3SiO 2) with 248-nm excimer laser light at fluences on the order of 2 J/cm2 per pulse, i.e., at the threshold for ablative etching of the glass surface. The negative charge emission consists of a very prompt photoelectron burst coincident with the laser pulse, followed by a much slower plume of electrons and negative ions traveling with a high density cloud of positive ions, previously identified as primarily Na+. Using combinations of E and B fields in conjunction with time-of-flight methods, the negative ions were successfully separated from the plume and tentatively identified as O-, Si-, NaO-, and perhaps NaSi-. These negative species are probably formed by gas phase collisions in the near-surface region which result in electron attachment.

    Original languageEnglish
    Pages (from-to)4253-4257
    Number of pages5
    JournalJournal of Applied Physics
    Volume68
    Issue number8
    DOIs
    Publication statusPublished - 1 Dec 1990

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    ASJC Scopus subject areas

    • Physics and Astronomy(all)

    Cite this

    Langford, S. C., Jensen, L. C., Dickinson, J. T., & Pederson, L. R. (1990). Negative charge emission due to excimer laser bombardment of sodium trisilicate glass. Journal of Applied Physics, 68(8), 4253-4257. https://doi.org/10.1063/1.346216