Morphology analysis of nickel thin films grown by MOCVD

Michael Becht, Fachri Atamny, A. Baiker, Klaus Hermann Dahmen

Research output: Contribution to journalArticle

19 Citations (Scopus)

Abstract

Nickel films on quartz substrates were prepared by metal-organic chemical vapor deposition (MOCVD), from the precursor bis(dimethylglyoximato)Ni(II), [Ni(dmg)2]. The deposition was carried out at reduced pressure in a horizontal quartz glass reactor. The samples were analysed by profilometry, X-ray diffraction, electron spectroscopy for chemical analysis, atomic force microscopy (AFM) and scanning electron microscopy. Resistances were determined by four-point resistivity measurements. The film microstructure was described by a simplified two-layer model using the data obtained from AFM, profilometry and resistivity measurements. In this model, the films consist of a compact layer (density ≈ 100%) between the substrate and the surface layer and a porous surface layer (density <100%). Increasing the substrate temperature resulted in an increase in the porous surface layer thickness which can be explained by the growth of separated grains rather than continuous film growth. The grains were thus poorly connected and the resistance increased with an increase in deposition temperature. Metallic films were obtained between 350 and 580°C.

Original languageEnglish
Pages (from-to)399-408
Number of pages10
JournalSurface Science
Volume371
Issue number2-3
Publication statusPublished - 1 Feb 1997
Externally publishedYes

Fingerprint

Organic Chemicals
Organic chemicals
Nickel
metalorganic chemical vapor deposition
Chemical vapor deposition
Quartz
Profilometry
Metals
nickel
Thin films
Atomic force microscopy
Substrates
thin films
surface layers
Metallic films
Electron spectroscopy
Film growth
quartz
atomic force microscopy
electrical resistivity

Keywords

  • Atomic force microscopy (AFM)
  • Growth
  • Metal-organic chemical vapor deposition (MOCVD)
  • Metallic films
  • Nickel
  • Polycrystalline thin films
  • Scanning electron microscopy (SEM)

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Becht, M., Atamny, F., Baiker, A., & Dahmen, K. H. (1997). Morphology analysis of nickel thin films grown by MOCVD. Surface Science, 371(2-3), 399-408.

Morphology analysis of nickel thin films grown by MOCVD. / Becht, Michael; Atamny, Fachri; Baiker, A.; Dahmen, Klaus Hermann.

In: Surface Science, Vol. 371, No. 2-3, 01.02.1997, p. 399-408.

Research output: Contribution to journalArticle

Becht, M, Atamny, F, Baiker, A & Dahmen, KH 1997, 'Morphology analysis of nickel thin films grown by MOCVD', Surface Science, vol. 371, no. 2-3, pp. 399-408.
Becht M, Atamny F, Baiker A, Dahmen KH. Morphology analysis of nickel thin films grown by MOCVD. Surface Science. 1997 Feb 1;371(2-3):399-408.
Becht, Michael ; Atamny, Fachri ; Baiker, A. ; Dahmen, Klaus Hermann. / Morphology analysis of nickel thin films grown by MOCVD. In: Surface Science. 1997 ; Vol. 371, No. 2-3. pp. 399-408.
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