MOCVD of high-TC superconducting materials

K. H. Dahmen, T. Gerfin

Research output: Contribution to journalArticle

31 Citations (Scopus)

Abstract

This present review gives a short overview of new developments of techniques and precursors for metalorganic chemical vapor deposition (MOCVD) in the field of high Tc superconducting (HTS) materials. Especially, the search for new precursors will be discussed in detail. The substrates and buffer layer systems, which have been used for HTS materials will be presented with respect to observed properties of the films. Finally, the physical properties and possible applications will be discussed briefly.

Original languageEnglish
Pages (from-to)117-161
Number of pages45
JournalProgress in Crystal Growth and Characterization of Materials
Volume27
Issue number2
DOIs
Publication statusPublished - 1993

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Keywords

  • MOCVD
  • buffer layers
  • precursors
  • substrates
  • superconductors
  • thin films

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics

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