Microstructure of ZrO2-CeO2 hetero-multi-layer films grown on YSZ substrate

C. M. Wang, S. Azad, V. Shutthanandan, D. E. McCready, C. H F Peden, L. Saraf, S. Thevuthasan

Research output: Contribution to journalArticle

24 Citations (Scopus)

Abstract

Multi-layer films of pure ZrO2 and CeO2 were grown using oxygen plasma assisted molecular beam epitaxy on yttria stabilized zirconia substrates. The microstructure of the film was analyzed using X-ray diffraction, conventional and high-resolution transmission electron microscopy, electron energy-loss spectroscopy, energy dispersive X-ray elemental mapping, selected area electron diffraction, and dynamical electron diffraction calculations. The deposited pure CeO2 layers exist in the cubic fluorite structure, and the ZrO2 layers show a good epitaxial orientation with respect to the CeO2 layers. However, distinctive forbidden diffraction spots of (odd, odd, even) type were observed on the selected area electron diffraction patterns of the film. Dark-field imaging clearly reveals that these forbidden diffraction spots were contributed solely by the ZrO2 layers. Dynamical electron diffraction calculation based on the tetragonal phase of unity tetragonality (space group P42/nmc) with oxygen displaced along the c-axis does not match with the experimental pattern. Instead, a diffraction pattern calculated based on a cubic structure (space group P4̄3m) for which the oxygen sub-lattice was displaced along the 〈1 1 1〉 matches with the experimental data. It is further suggested that the displacement of the oxygen from the ideal (1/4, 1/4, 1/4) position was introduced during the film growth process.

Original languageEnglish
Pages (from-to)1921-1929
Number of pages9
JournalActa Materialia
Volume53
Issue number7
DOIs
Publication statusPublished - Apr 2005
Externally publishedYes

Fingerprint

Multilayer films
Electron diffraction
Oxygen
Microstructure
Substrates
Diffraction patterns
Diffraction
Fluorspar
Electron energy loss spectroscopy
Yttria stabilized zirconia
Film growth
High resolution transmission electron microscopy
Molecular beam epitaxy
Plasmas
Imaging techniques
X ray diffraction
X rays

Keywords

  • Nano film
  • TEM
  • ZrO/CeO

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Science(all)
  • Metals and Alloys

Cite this

Wang, C. M., Azad, S., Shutthanandan, V., McCready, D. E., Peden, C. H. F., Saraf, L., & Thevuthasan, S. (2005). Microstructure of ZrO2-CeO2 hetero-multi-layer films grown on YSZ substrate. Acta Materialia, 53(7), 1921-1929. https://doi.org/10.1016/j.actamat.2005.01.003

Microstructure of ZrO2-CeO2 hetero-multi-layer films grown on YSZ substrate. / Wang, C. M.; Azad, S.; Shutthanandan, V.; McCready, D. E.; Peden, C. H F; Saraf, L.; Thevuthasan, S.

In: Acta Materialia, Vol. 53, No. 7, 04.2005, p. 1921-1929.

Research output: Contribution to journalArticle

Wang, CM, Azad, S, Shutthanandan, V, McCready, DE, Peden, CHF, Saraf, L & Thevuthasan, S 2005, 'Microstructure of ZrO2-CeO2 hetero-multi-layer films grown on YSZ substrate', Acta Materialia, vol. 53, no. 7, pp. 1921-1929. https://doi.org/10.1016/j.actamat.2005.01.003
Wang CM, Azad S, Shutthanandan V, McCready DE, Peden CHF, Saraf L et al. Microstructure of ZrO2-CeO2 hetero-multi-layer films grown on YSZ substrate. Acta Materialia. 2005 Apr;53(7):1921-1929. https://doi.org/10.1016/j.actamat.2005.01.003
Wang, C. M. ; Azad, S. ; Shutthanandan, V. ; McCready, D. E. ; Peden, C. H F ; Saraf, L. ; Thevuthasan, S. / Microstructure of ZrO2-CeO2 hetero-multi-layer films grown on YSZ substrate. In: Acta Materialia. 2005 ; Vol. 53, No. 7. pp. 1921-1929.
@article{4510eb7e2518455795d2abbe694cc44a,
title = "Microstructure of ZrO2-CeO2 hetero-multi-layer films grown on YSZ substrate",
abstract = "Multi-layer films of pure ZrO2 and CeO2 were grown using oxygen plasma assisted molecular beam epitaxy on yttria stabilized zirconia substrates. The microstructure of the film was analyzed using X-ray diffraction, conventional and high-resolution transmission electron microscopy, electron energy-loss spectroscopy, energy dispersive X-ray elemental mapping, selected area electron diffraction, and dynamical electron diffraction calculations. The deposited pure CeO2 layers exist in the cubic fluorite structure, and the ZrO2 layers show a good epitaxial orientation with respect to the CeO2 layers. However, distinctive forbidden diffraction spots of (odd, odd, even) type were observed on the selected area electron diffraction patterns of the film. Dark-field imaging clearly reveals that these forbidden diffraction spots were contributed solely by the ZrO2 layers. Dynamical electron diffraction calculation based on the tetragonal phase of unity tetragonality (space group P42/nmc) with oxygen displaced along the c-axis does not match with the experimental pattern. Instead, a diffraction pattern calculated based on a cubic structure (space group P4̄3m) for which the oxygen sub-lattice was displaced along the 〈1 1 1〉 matches with the experimental data. It is further suggested that the displacement of the oxygen from the ideal (1/4, 1/4, 1/4) position was introduced during the film growth process.",
keywords = "Nano film, TEM, ZrO/CeO",
author = "Wang, {C. M.} and S. Azad and V. Shutthanandan and McCready, {D. E.} and Peden, {C. H F} and L. Saraf and S. Thevuthasan",
year = "2005",
month = "4",
doi = "10.1016/j.actamat.2005.01.003",
language = "English",
volume = "53",
pages = "1921--1929",
journal = "Acta Materialia",
issn = "1359-6454",
publisher = "Elsevier Limited",
number = "7",

}

TY - JOUR

T1 - Microstructure of ZrO2-CeO2 hetero-multi-layer films grown on YSZ substrate

AU - Wang, C. M.

AU - Azad, S.

AU - Shutthanandan, V.

AU - McCready, D. E.

AU - Peden, C. H F

AU - Saraf, L.

AU - Thevuthasan, S.

PY - 2005/4

Y1 - 2005/4

N2 - Multi-layer films of pure ZrO2 and CeO2 were grown using oxygen plasma assisted molecular beam epitaxy on yttria stabilized zirconia substrates. The microstructure of the film was analyzed using X-ray diffraction, conventional and high-resolution transmission electron microscopy, electron energy-loss spectroscopy, energy dispersive X-ray elemental mapping, selected area electron diffraction, and dynamical electron diffraction calculations. The deposited pure CeO2 layers exist in the cubic fluorite structure, and the ZrO2 layers show a good epitaxial orientation with respect to the CeO2 layers. However, distinctive forbidden diffraction spots of (odd, odd, even) type were observed on the selected area electron diffraction patterns of the film. Dark-field imaging clearly reveals that these forbidden diffraction spots were contributed solely by the ZrO2 layers. Dynamical electron diffraction calculation based on the tetragonal phase of unity tetragonality (space group P42/nmc) with oxygen displaced along the c-axis does not match with the experimental pattern. Instead, a diffraction pattern calculated based on a cubic structure (space group P4̄3m) for which the oxygen sub-lattice was displaced along the 〈1 1 1〉 matches with the experimental data. It is further suggested that the displacement of the oxygen from the ideal (1/4, 1/4, 1/4) position was introduced during the film growth process.

AB - Multi-layer films of pure ZrO2 and CeO2 were grown using oxygen plasma assisted molecular beam epitaxy on yttria stabilized zirconia substrates. The microstructure of the film was analyzed using X-ray diffraction, conventional and high-resolution transmission electron microscopy, electron energy-loss spectroscopy, energy dispersive X-ray elemental mapping, selected area electron diffraction, and dynamical electron diffraction calculations. The deposited pure CeO2 layers exist in the cubic fluorite structure, and the ZrO2 layers show a good epitaxial orientation with respect to the CeO2 layers. However, distinctive forbidden diffraction spots of (odd, odd, even) type were observed on the selected area electron diffraction patterns of the film. Dark-field imaging clearly reveals that these forbidden diffraction spots were contributed solely by the ZrO2 layers. Dynamical electron diffraction calculation based on the tetragonal phase of unity tetragonality (space group P42/nmc) with oxygen displaced along the c-axis does not match with the experimental pattern. Instead, a diffraction pattern calculated based on a cubic structure (space group P4̄3m) for which the oxygen sub-lattice was displaced along the 〈1 1 1〉 matches with the experimental data. It is further suggested that the displacement of the oxygen from the ideal (1/4, 1/4, 1/4) position was introduced during the film growth process.

KW - Nano film

KW - TEM

KW - ZrO/CeO

UR - http://www.scopus.com/inward/record.url?scp=14644403083&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=14644403083&partnerID=8YFLogxK

U2 - 10.1016/j.actamat.2005.01.003

DO - 10.1016/j.actamat.2005.01.003

M3 - Article

AN - SCOPUS:14644403083

VL - 53

SP - 1921

EP - 1929

JO - Acta Materialia

JF - Acta Materialia

SN - 1359-6454

IS - 7

ER -