Investigation and characterization of thin MOCVD copper films from pyrazolylborato - copper (I) complexes

E. C. Plappert, K. H. Dahmen, H. Van Den Bergh, T. Stumm, R. Hauert

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Thin copper layers were prepared via MOCVD from volatile pyrazolylborato - copper (I) complexes. Experiments involved chemical vapour deposition in a low pressure reactor between 150 - 350°C in H 2/N 2/He mixtures were carried out. Substrate temperature, source temperature and gas composition were varied to obtain the optimum growth rate. The copper layers were characterized by optical microscopy and scanning electron microscopy, XRD, and WDX. The metallic nature of the deposited films was proved by a four - point - probe measurement of the electrical resistivity. A selective deposition on metal seeded surface sites was observed on Au, Al, Pt and W vs. SiO 2. Antiselective deposition was achieved on Pd seeded samples.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium - Proceedings
PublisherMaterials Research Society
Pages697-702
Number of pages6
Volume337
Publication statusPublished - 1994
Externally publishedYes
EventProceedings of the 1994 MRS Spring Meeting - San Francisco, CA, USA
Duration: 4 Apr 19948 Apr 1994

Other

OtherProceedings of the 1994 MRS Spring Meeting
CitySan Francisco, CA, USA
Period4/4/948/4/94

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ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Plappert, E. C., Dahmen, K. H., Van Den Bergh, H., Stumm, T., & Hauert, R. (1994). Investigation and characterization of thin MOCVD copper films from pyrazolylborato - copper (I) complexes. In Materials Research Society Symposium - Proceedings (Vol. 337, pp. 697-702). Materials Research Society.