Integration of a 2-D periodic nanopattern into thin-film polycrystalline silicon solar cells by nanoimprint lithography

Islam Abdo, Christos Trompoukis, Jan Deckers, Valerie Depauw, Loic Tous, Dries Van Gestel, Rafik Guindi, Ivan Gordon, Ounsi El Daif

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

The integration of 2-D periodic nanopattern defined by nanoimprint lithography and dry etching into aluminum-induced crystallization-based polycrystalline silicon thin-film solar cells is investigated experimentally. Compared with the unpatterned cell, an increase of 6% in the light absorption has been achieved thanks to the nanopattern, which, in turn, increased the short-circuit current from 20.6 to 23.8 mA/cm2. The efficiency, on the other hand, has limitedly increased from 6.4% to 6.7%. We show using the transfer length method that the surface topography modification caused by the nanopattern has increased the sheet resistance of the antireflection coating (ARC) layer as well as the contact resistance between the ARC layer and the emitter front contacts. This, in turn, resulted in increased series resistance of the nanopatterned cell, which has translated into a decreased fill factor, explaining the limited increase in the efficiency.

Original languageEnglish
Article number6868226
Pages (from-to)1261-1267
Number of pages7
JournalIEEE Journal of Photovoltaics
Volume4
Issue number5
DOIs
Publication statusPublished - 2014
Externally publishedYes

Fingerprint

Nanoimprint lithography
Antireflection coatings
antireflection coatings
Silicon solar cells
Polysilicon
lithography
solar cells
Thin films
Dry etching
Sheet resistance
Surface topography
Contact resistance
short circuit currents
thin films
electromagnetic absorption
Crystallization
contact resistance
cells
Aluminum
Short circuit currents

Keywords

  • Aluminum-induced crystallization (AIC)
  • light trapping
  • nanoimprint lithography (NIL)
  • nanopatterning
  • nanophotonics
  • polycrystalline silicon (Poly-Si)
  • thin-film solar cells
  • transfer length method (TLM)

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Abdo, I., Trompoukis, C., Deckers, J., Depauw, V., Tous, L., Van Gestel, D., ... El Daif, O. (2014). Integration of a 2-D periodic nanopattern into thin-film polycrystalline silicon solar cells by nanoimprint lithography. IEEE Journal of Photovoltaics, 4(5), 1261-1267. [6868226]. https://doi.org/10.1109/JPHOTOV.2014.2339498

Integration of a 2-D periodic nanopattern into thin-film polycrystalline silicon solar cells by nanoimprint lithography. / Abdo, Islam; Trompoukis, Christos; Deckers, Jan; Depauw, Valerie; Tous, Loic; Van Gestel, Dries; Guindi, Rafik; Gordon, Ivan; El Daif, Ounsi.

In: IEEE Journal of Photovoltaics, Vol. 4, No. 5, 6868226, 2014, p. 1261-1267.

Research output: Contribution to journalArticle

Abdo, I, Trompoukis, C, Deckers, J, Depauw, V, Tous, L, Van Gestel, D, Guindi, R, Gordon, I & El Daif, O 2014, 'Integration of a 2-D periodic nanopattern into thin-film polycrystalline silicon solar cells by nanoimprint lithography', IEEE Journal of Photovoltaics, vol. 4, no. 5, 6868226, pp. 1261-1267. https://doi.org/10.1109/JPHOTOV.2014.2339498
Abdo, Islam ; Trompoukis, Christos ; Deckers, Jan ; Depauw, Valerie ; Tous, Loic ; Van Gestel, Dries ; Guindi, Rafik ; Gordon, Ivan ; El Daif, Ounsi. / Integration of a 2-D periodic nanopattern into thin-film polycrystalline silicon solar cells by nanoimprint lithography. In: IEEE Journal of Photovoltaics. 2014 ; Vol. 4, No. 5. pp. 1261-1267.
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AU - Guindi, Rafik

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