Hybrid pulsed laser deposition of Ti-Cu-N ternary nitride thin films

Grigorios Matenoglou, G. A. Evangelakis, C. Kosmidis, P. Patsalas

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

In this work we present the growth of Ti-Cu-N ternary films by a hybrid Pulsed Laser Deposition (PLD) process. In the configuration used, the metal source was a composite Ti-Cu target, which was ablated by a high-fluence Nd:YAG laser (2nd harmonic, λ=532 nm) in a flowing N2. The process was carried out in a homogeneous electric field with the substrate being at a negative DC potential (bias voltage Vb=-50 V) with respect to the ablation target. Films with the typical gold-like appearance of TiN were grown at PN2∼10-1 Pa. The effects of PN2 to the Metal/N ratio and Ti/Cu ratio into the films, as well as the crystal structure of the films were studied employing Auger Electron Spectroscopy (AES) and X-Ray Diffraction (XRD), respectively. The films were found to consist of nanocrystalline TiN and amorphous Cu. Cu did not crystallize even in the Curich films. The N was found to be bonded exclusively with Ti.

Original languageEnglish
Pages (from-to)38-43
Number of pages6
JournalReviews on Advanced Materials Science
Volume15
Issue number1
Publication statusPublished - Sep 2007
Externally publishedYes

Fingerprint

Pulsed laser deposition
Nitrides
pulsed laser deposition
nitrides
Thin films
thin films
Metals
Auger electron spectroscopy
Bias voltage
Ablation
Gold
metals
ablation
Auger spectroscopy
electron spectroscopy
YAG lasers
fluence
Crystal structure
direct current
Electric fields

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Science (miscellaneous)

Cite this

Hybrid pulsed laser deposition of Ti-Cu-N ternary nitride thin films. / Matenoglou, Grigorios; Evangelakis, G. A.; Kosmidis, C.; Patsalas, P.

In: Reviews on Advanced Materials Science, Vol. 15, No. 1, 09.2007, p. 38-43.

Research output: Contribution to journalArticle

Matenoglou, G, Evangelakis, GA, Kosmidis, C & Patsalas, P 2007, 'Hybrid pulsed laser deposition of Ti-Cu-N ternary nitride thin films', Reviews on Advanced Materials Science, vol. 15, no. 1, pp. 38-43.
Matenoglou, Grigorios ; Evangelakis, G. A. ; Kosmidis, C. ; Patsalas, P. / Hybrid pulsed laser deposition of Ti-Cu-N ternary nitride thin films. In: Reviews on Advanced Materials Science. 2007 ; Vol. 15, No. 1. pp. 38-43.
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