Growth of iridium films by metal organic chemical vapour deposition

Tobias Gerfin, Werner J. Hälg, Fachri Atamny, Klaus Hermann Dahmen

Research output: Contribution to journalArticle

38 Citations (Scopus)

Abstract

Thin films of metallic iridium were grown by thermal metal organic chemical vapour deposition in a horizontal hot-wall reactor. The new solid compound Ir(2,2,6,6-tetramethyl-3,5-heptadione)(1,5-cyclooctadiene) was used as the iridium source. Evaporation rate experiments showed a rather poor volatility of this compound compared with Ir(acetylacetone)(1,5-cyclooctadiene). However, high growth rates of 0.25 μ h-1 could be realized at substrate temperatures of 350 °C using a graphite susceptor coated with iridium andisopropanol as a component of the reaction gas. The films were pure metallic, as shown by emission spectroscopy for chemical analysis, and had typical sheet resistances of 50 μω □-1.

Original languageEnglish
Pages (from-to)352-355
Number of pages4
JournalThin Solid Films
Volume241
Issue number1-2
Publication statusPublished - 1 Apr 1994
Externally publishedYes

Fingerprint

Organic Chemicals
Iridium
Organic chemicals
iridium
metalorganic chemical vapor deposition
Chemical vapor deposition
Metals
acetylacetone
Graphite
evaporation rate
volatility
Sheet resistance
Emission spectroscopy
chemical analysis
Evaporation
graphite
Gases
reactors
Thin films
Substrates

ASJC Scopus subject areas

  • Surfaces and Interfaces
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

Cite this

Gerfin, T., Hälg, W. J., Atamny, F., & Dahmen, K. H. (1994). Growth of iridium films by metal organic chemical vapour deposition. Thin Solid Films, 241(1-2), 352-355.

Growth of iridium films by metal organic chemical vapour deposition. / Gerfin, Tobias; Hälg, Werner J.; Atamny, Fachri; Dahmen, Klaus Hermann.

In: Thin Solid Films, Vol. 241, No. 1-2, 01.04.1994, p. 352-355.

Research output: Contribution to journalArticle

Gerfin, T, Hälg, WJ, Atamny, F & Dahmen, KH 1994, 'Growth of iridium films by metal organic chemical vapour deposition', Thin Solid Films, vol. 241, no. 1-2, pp. 352-355.
Gerfin T, Hälg WJ, Atamny F, Dahmen KH. Growth of iridium films by metal organic chemical vapour deposition. Thin Solid Films. 1994 Apr 1;241(1-2):352-355.
Gerfin, Tobias ; Hälg, Werner J. ; Atamny, Fachri ; Dahmen, Klaus Hermann. / Growth of iridium films by metal organic chemical vapour deposition. In: Thin Solid Films. 1994 ; Vol. 241, No. 1-2. pp. 352-355.
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