Growth of Copper Films by Metal Organic Vapor Deposition Using (Pyrazolylborate)copper(I) Compounds

Elisabeth Charlotte Plappert, Thomas Stumm, Herbert Van Den Bergh, Roland Hauert, Klaus Hermann Dahmen

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

CuCl reacts with Na[HB(R3R5pz)3] and phosphine (PR3) or isonitrile (CNR) to yield volatile (pyrazolylborate)copper(I) complexes. These compounds were evaluated as MOCVD precursors. Using [{HB(pz)3}Cu(PEt3)] and [{HB(pz)3}Cu(PMe3)], thin copper films were grown by thermal metal organic chemical vapor deposition in a low pressure reactor in the temperature range 150-350°C. Polycrystalline Cu-phases were obtained at temperatures as low as 150°C. The metallic films were characterized by four-point-probe resistivity measurements, AES, and XPS, as well as AFM and SEM. Selective deposition on metal-seeded surface sites was observed on Pt, Au, Al, and W versus SiO2. Anti-selective deposition was found to occur on Pd-seeded samples.

Original languageEnglish
Pages (from-to)37-43
Number of pages7
JournalChemical Vapor Deposition
Volume3
Issue number1
Publication statusPublished - 1 Dec 1997
Externally publishedYes

Fingerprint

Copper compounds
phosphine
Vapor deposition
metalorganic chemical vapor deposition
Copper
Metals
vapor deposition
Organic Chemicals
copper
Metallic films
Organic chemicals
Metallorganic chemical vapor deposition
phosphines
metals
metal surfaces
Chemical vapor deposition
X ray photoelectron spectroscopy
low pressure
reactors
atomic force microscopy

Keywords

  • Copper
  • MOCVD
  • Precursor
  • Pyrazolyborate

ASJC Scopus subject areas

  • Process Chemistry and Technology
  • Electrochemistry
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Plappert, E. C., Stumm, T., Van Den Bergh, H., Hauert, R., & Dahmen, K. H. (1997). Growth of Copper Films by Metal Organic Vapor Deposition Using (Pyrazolylborate)copper(I) Compounds. Chemical Vapor Deposition, 3(1), 37-43.

Growth of Copper Films by Metal Organic Vapor Deposition Using (Pyrazolylborate)copper(I) Compounds. / Plappert, Elisabeth Charlotte; Stumm, Thomas; Van Den Bergh, Herbert; Hauert, Roland; Dahmen, Klaus Hermann.

In: Chemical Vapor Deposition, Vol. 3, No. 1, 01.12.1997, p. 37-43.

Research output: Contribution to journalArticle

Plappert, EC, Stumm, T, Van Den Bergh, H, Hauert, R & Dahmen, KH 1997, 'Growth of Copper Films by Metal Organic Vapor Deposition Using (Pyrazolylborate)copper(I) Compounds', Chemical Vapor Deposition, vol. 3, no. 1, pp. 37-43.
Plappert EC, Stumm T, Van Den Bergh H, Hauert R, Dahmen KH. Growth of Copper Films by Metal Organic Vapor Deposition Using (Pyrazolylborate)copper(I) Compounds. Chemical Vapor Deposition. 1997 Dec 1;3(1):37-43.
Plappert, Elisabeth Charlotte ; Stumm, Thomas ; Van Den Bergh, Herbert ; Hauert, Roland ; Dahmen, Klaus Hermann. / Growth of Copper Films by Metal Organic Vapor Deposition Using (Pyrazolylborate)copper(I) Compounds. In: Chemical Vapor Deposition. 1997 ; Vol. 3, No. 1. pp. 37-43.
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