Growth and characterization of ZnO thin films prepared by electrodeposition technique

M. Fahoume, O. Maghfoul, M. Aggour, B. Hartiti, F. Chraïbi, A. Ennaoui

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75 Citations (Scopus)

Abstract

ZnO thin films were deposited on either indium tin oxide-coated glass or copper substrate by the electrodeposition process, using zinc chloride and flowing air as precursors. The effect of pH on the structural and morphological ZnO films was studied and the optimum deposition conditions have been outlined. The kinetics of the growth of the films have been investigated. We note that the rate of deposition of ZnO in an acidic solution was larger than in a basic solution. The structure of the films was studied using X-ray diffractometry (XRD) and transmission electron microscopy (TEM). The surface morphology and thickness of the films were determined using scanning electron microscopy. The X-ray diffraction analysis shows that the films are polycrystalline with hexagonal crystal structure (zincite) at pH 4. The optical transmittance of ZnO decreases with varying film thickness. The optical energy bandgap was found to be 3.26 eV.

Original languageEnglish
Pages (from-to)1437-1444
Number of pages8
JournalSolar Energy Materials and Solar Cells
Volume90
Issue number10
DOIs
Publication statusPublished - 15 Jun 2006

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Keywords

  • Electrodeposition
  • Optical transmittance
  • Structural properties
  • ZnO

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films

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