Enhanced absorption in thin crystalline silicon films for solar cells by nanoimprint lithography

Christos Trompoukis, Aline Herman, Ounsi El Daif, Valerie Depauw, Dries Van Gestel, Kris Van Nieuwenhuysen, Ivan Gordon, Olivier Deparis, Jef Poortmans

Research output: Chapter in Book/Report/Conference proceedingConference contribution

12 Citations (Scopus)

Abstract

Two dimensional (2D) periodic photonic nanostructures, fabricated by nanoimprint lithography (NIL) and dry etching on the front surface of crystalline silicon (c-Si) layers, are investigated experimentally and theoretically in order to characterize their optical properties and demonstrate their relevance to photovoltaic (PV) applications. Nanoimprint lithography is performed on c-Si wafers and ultra-thin c-Si films with various thicknesses. A comparison with state-of-the-art front side texturing with an antireflection coating is made. The 2D periodic photonic nanostructures result in an enhanced light absorption in the photoactive material. The results are validated through simulations based on Rigorous Coupled Wave Analysis (RCWA). The nanoimprinted substrates result in a similar absorption compared to the state-of-the-art random pyramid texturing while consuming less than a micron of photoactive material. In contrast to the random pyramid texturing, the nanopatterning exhibits a robust performance for a wide range of incident angles up to 70°. The light trapping mechanism we propose is based on the combination of a graded index effect and the diffraction of light inside the photoactive layer at high angles.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
Volume8438
DOIs
Publication statusPublished - 2012
Externally publishedYes
EventPhotonics for Solar Energy Systems IV - Brussels, Belgium
Duration: 16 Apr 201218 Apr 2012

Other

OtherPhotonics for Solar Energy Systems IV
CountryBelgium
CityBrussels
Period16/4/1218/4/12

Fingerprint

Nanoimprint Lithography
Nanoimprint lithography
Texturing
Silicon
Solar Cells
silicon films
pyramids
Solar cells
Absorption
lithography
solar cells
Pyramid
photonics
Crystalline materials
Nanostructures
Photonics
antireflection coatings
silicon
electromagnetic absorption
Antireflection Coating

Keywords

  • Anti-reflection texturing
  • Crystalline silicon solar cells
  • Diffraction
  • Light-management
  • Light-trapping
  • Photonic nanostructures
  • Thin-film silicon solar cells

ASJC Scopus subject areas

  • Applied Mathematics
  • Computer Science Applications
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Trompoukis, C., Herman, A., El Daif, O., Depauw, V., Van Gestel, D., Van Nieuwenhuysen, K., ... Poortmans, J. (2012). Enhanced absorption in thin crystalline silicon films for solar cells by nanoimprint lithography. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 8438). [84380R] https://doi.org/10.1117/12.921212

Enhanced absorption in thin crystalline silicon films for solar cells by nanoimprint lithography. / Trompoukis, Christos; Herman, Aline; El Daif, Ounsi; Depauw, Valerie; Van Gestel, Dries; Van Nieuwenhuysen, Kris; Gordon, Ivan; Deparis, Olivier; Poortmans, Jef.

Proceedings of SPIE - The International Society for Optical Engineering. Vol. 8438 2012. 84380R.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Trompoukis, C, Herman, A, El Daif, O, Depauw, V, Van Gestel, D, Van Nieuwenhuysen, K, Gordon, I, Deparis, O & Poortmans, J 2012, Enhanced absorption in thin crystalline silicon films for solar cells by nanoimprint lithography. in Proceedings of SPIE - The International Society for Optical Engineering. vol. 8438, 84380R, Photonics for Solar Energy Systems IV, Brussels, Belgium, 16/4/12. https://doi.org/10.1117/12.921212
Trompoukis C, Herman A, El Daif O, Depauw V, Van Gestel D, Van Nieuwenhuysen K et al. Enhanced absorption in thin crystalline silicon films for solar cells by nanoimprint lithography. In Proceedings of SPIE - The International Society for Optical Engineering. Vol. 8438. 2012. 84380R https://doi.org/10.1117/12.921212
Trompoukis, Christos ; Herman, Aline ; El Daif, Ounsi ; Depauw, Valerie ; Van Gestel, Dries ; Van Nieuwenhuysen, Kris ; Gordon, Ivan ; Deparis, Olivier ; Poortmans, Jef. / Enhanced absorption in thin crystalline silicon films for solar cells by nanoimprint lithography. Proceedings of SPIE - The International Society for Optical Engineering. Vol. 8438 2012.
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