Effect of tantalum addition on microstructure and optical properties of TiN thin films

O. Bourbia, S. Achour, Nouar Tabet, M. Parlinska, A. Harabi

Research output: Contribution to journalArticle

27 Citations (Scopus)

Abstract

Titanium nitride thin films were deposited by direct current magnetron sputtering with various tantalum (Ta) concentrations (2, 4 and 8 at.%). The films were characterized using UV/VIS spectrophotometer. Atomic force microscopy (AFM), high resolution transmission electron microscope (HRTEM) were used to observe the microstructure and X-ray photoelectron spectroscopy was used to investigate the core level and the valence band of the films. It was found that the film with 2 at.% Ta is more reflective in the infrared range and more transparent in the visible region (selective behavior). The AFM showed smooth nanostructured surface for the film without Ta addition. It was found that the films with 2 at.% Ta presented relatively coarser grains with larger roughness and the reflectance are not controlled by the surface morphology. Also, this film presented higher electrical conductivity. HRTEM analysis showed that 2 at.% Ta addition gave rise to well crystallized films with elongated nanocrystallites in comparison with the films having 0, 4 and 8 at.% Ta contents.

Original languageEnglish
Pages (from-to)6758-6764
Number of pages7
JournalThin Solid Films
Volume515
Issue number17
DOIs
Publication statusPublished - 1 Jun 2007
Externally publishedYes

Fingerprint

Tantalum
tantalum
Optical properties
optical properties
Thin films
microstructure
Microstructure
thin films
Atomic force microscopy
Electron microscopes
electron microscopes
atomic force microscopy
Ultraviolet spectrophotometers
Nanocrystallites
Titanium nitride
Core levels
titanium nitrides
high resolution
spectrophotometers
Valence bands

Keywords

  • Reflectance
  • Sputtering
  • Ta
  • TiN
  • Valence band

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Effect of tantalum addition on microstructure and optical properties of TiN thin films. / Bourbia, O.; Achour, S.; Tabet, Nouar; Parlinska, M.; Harabi, A.

In: Thin Solid Films, Vol. 515, No. 17, 01.06.2007, p. 6758-6764.

Research output: Contribution to journalArticle

Bourbia, O. ; Achour, S. ; Tabet, Nouar ; Parlinska, M. ; Harabi, A. / Effect of tantalum addition on microstructure and optical properties of TiN thin films. In: Thin Solid Films. 2007 ; Vol. 515, No. 17. pp. 6758-6764.
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