Effect of electron irradiation on properties of chemically deposited TiO2 nanorods

Dattatray Dhawale, D. P. Dubal, R. R. Salunkhe, T. P. Gujar, M. C. Rath, C. D. Lokhande

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16 Citations (Scopus)


TiO2 nanorods were grown by using soft chemical route at room temperature on glass substrate and subjected to electron beam irradiation after annealing for 2 h in air at 723 K. The effect of annealing and high energy (7 MeV) electron beam irradiation on the structural, morphological, wettability, optical and electrical properties of the films has been investigated. The electron bombardment leads amorphous to crystalline structure, increase in length and diameter of nanorods, increase in contact angle from 2° to 9°, red shift of 0.24 eV in the band gap and decrease in room temperature electrical resistivity from 106 to 103 of TiO2 nanorods. The changes in the material property are ascribed to the effect of electron beam irradiation.

Original languageEnglish
Pages (from-to)63-67
Number of pages5
JournalJournal of Alloys and Compounds
Issue number1
Publication statusPublished - 4 Jun 2010
Externally publishedYes



  • CBD
  • Electron irradiation
  • Nanorods
  • Thin films
  • TiO

ASJC Scopus subject areas

  • Mechanical Engineering
  • Mechanics of Materials
  • Materials Chemistry
  • Metals and Alloys

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