Effect of electron irradiation on properties of chemically deposited TiO2 nanorods

Dattatray Dhawale, D. P. Dubal, R. R. Salunkhe, T. P. Gujar, M. C. Rath, C. D. Lokhande

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

TiO2 nanorods were grown by using soft chemical route at room temperature on glass substrate and subjected to electron beam irradiation after annealing for 2 h in air at 723 K. The effect of annealing and high energy (7 MeV) electron beam irradiation on the structural, morphological, wettability, optical and electrical properties of the films has been investigated. The electron bombardment leads amorphous to crystalline structure, increase in length and diameter of nanorods, increase in contact angle from 2° to 9°, red shift of 0.24 eV in the band gap and decrease in room temperature electrical resistivity from 106 to 103 of TiO2 nanorods. The changes in the material property are ascribed to the effect of electron beam irradiation.

Original languageEnglish
Pages (from-to)63-67
Number of pages5
JournalJournal of Alloys and Compounds
Volume499
Issue number1
DOIs
Publication statusPublished - 4 Jun 2010
Externally publishedYes

Fingerprint

Electron irradiation
Nanorods
Electron beams
Irradiation
Annealing
Contact angle
Wetting
Materials properties
Electric properties
Energy gap
Optical properties
Crystalline materials
Glass
Temperature
Electrons
Substrates
Air

Keywords

  • CBD
  • Electron irradiation
  • Nanorods
  • Thin films
  • TiO

ASJC Scopus subject areas

  • Mechanical Engineering
  • Mechanics of Materials
  • Materials Chemistry
  • Metals and Alloys

Cite this

Effect of electron irradiation on properties of chemically deposited TiO2 nanorods. / Dhawale, Dattatray; Dubal, D. P.; Salunkhe, R. R.; Gujar, T. P.; Rath, M. C.; Lokhande, C. D.

In: Journal of Alloys and Compounds, Vol. 499, No. 1, 04.06.2010, p. 63-67.

Research output: Contribution to journalArticle

Dhawale, Dattatray ; Dubal, D. P. ; Salunkhe, R. R. ; Gujar, T. P. ; Rath, M. C. ; Lokhande, C. D. / Effect of electron irradiation on properties of chemically deposited TiO2 nanorods. In: Journal of Alloys and Compounds. 2010 ; Vol. 499, No. 1. pp. 63-67.
@article{8152fa593d7d4dd7bb716750f0d719e6,
title = "Effect of electron irradiation on properties of chemically deposited TiO2 nanorods",
abstract = "TiO2 nanorods were grown by using soft chemical route at room temperature on glass substrate and subjected to electron beam irradiation after annealing for 2 h in air at 723 K. The effect of annealing and high energy (7 MeV) electron beam irradiation on the structural, morphological, wettability, optical and electrical properties of the films has been investigated. The electron bombardment leads amorphous to crystalline structure, increase in length and diameter of nanorods, increase in contact angle from 2° to 9°, red shift of 0.24 eV in the band gap and decrease in room temperature electrical resistivity from 106 to 103 of TiO2 nanorods. The changes in the material property are ascribed to the effect of electron beam irradiation.",
keywords = "CBD, Electron irradiation, Nanorods, Thin films, TiO",
author = "Dattatray Dhawale and Dubal, {D. P.} and Salunkhe, {R. R.} and Gujar, {T. P.} and Rath, {M. C.} and Lokhande, {C. D.}",
year = "2010",
month = "6",
day = "4",
doi = "10.1016/j.jallcom.2010.01.126",
language = "English",
volume = "499",
pages = "63--67",
journal = "Journal of Alloys and Compounds",
issn = "0925-8388",
publisher = "Elsevier BV",
number = "1",

}

TY - JOUR

T1 - Effect of electron irradiation on properties of chemically deposited TiO2 nanorods

AU - Dhawale, Dattatray

AU - Dubal, D. P.

AU - Salunkhe, R. R.

AU - Gujar, T. P.

AU - Rath, M. C.

AU - Lokhande, C. D.

PY - 2010/6/4

Y1 - 2010/6/4

N2 - TiO2 nanorods were grown by using soft chemical route at room temperature on glass substrate and subjected to electron beam irradiation after annealing for 2 h in air at 723 K. The effect of annealing and high energy (7 MeV) electron beam irradiation on the structural, morphological, wettability, optical and electrical properties of the films has been investigated. The electron bombardment leads amorphous to crystalline structure, increase in length and diameter of nanorods, increase in contact angle from 2° to 9°, red shift of 0.24 eV in the band gap and decrease in room temperature electrical resistivity from 106 to 103 of TiO2 nanorods. The changes in the material property are ascribed to the effect of electron beam irradiation.

AB - TiO2 nanorods were grown by using soft chemical route at room temperature on glass substrate and subjected to electron beam irradiation after annealing for 2 h in air at 723 K. The effect of annealing and high energy (7 MeV) electron beam irradiation on the structural, morphological, wettability, optical and electrical properties of the films has been investigated. The electron bombardment leads amorphous to crystalline structure, increase in length and diameter of nanorods, increase in contact angle from 2° to 9°, red shift of 0.24 eV in the band gap and decrease in room temperature electrical resistivity from 106 to 103 of TiO2 nanorods. The changes in the material property are ascribed to the effect of electron beam irradiation.

KW - CBD

KW - Electron irradiation

KW - Nanorods

KW - Thin films

KW - TiO

UR - http://www.scopus.com/inward/record.url?scp=77953171346&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77953171346&partnerID=8YFLogxK

U2 - 10.1016/j.jallcom.2010.01.126

DO - 10.1016/j.jallcom.2010.01.126

M3 - Article

VL - 499

SP - 63

EP - 67

JO - Journal of Alloys and Compounds

JF - Journal of Alloys and Compounds

SN - 0925-8388

IS - 1

ER -