Dry etching to form submicron features in CMR oxides: (Pr,Ba,Ca)MnO3 and (La,Sr)MnO3

K. P. Lee, K. B. Jung, H. Cho, D. Kumar, S. V. Pietambaram, R. K. Singh, P. H. Hogan, K. H. Dahmen, Y. B. Hahn, S. J. Pearton

Research output: Contribution to journalArticle

Abstract

Effective pattern transfer into (Pr,Ba,Ca)MnO3 and (La,Sr)MnO3 has been achieved using Cl2/Ar discharges operated under Inductively Coupled Plasma conditions. Etch rates up to 900 A-min"1 for (La,Sr)MnO3 and 300 A-min'1 for (Pr,Ba,Ca)MnOj were obtained, with these rates being a strong function of ion flux, ion energy and ion-to-neutral ratio. The etching is still physically-dominated under all conditions, leading to significant surface smoothing on initially rough samples. Sub-micron (0.35 Um) features have been produced in both materials using SiN, as the mask.

Original languageEnglish
Pages (from-to)341-346
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume574
Publication statusPublished - 1 Dec 1999

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ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Lee, K. P., Jung, K. B., Cho, H., Kumar, D., Pietambaram, S. V., Singh, R. K., Hogan, P. H., Dahmen, K. H., Hahn, Y. B., & Pearton, S. J. (1999). Dry etching to form submicron features in CMR oxides: (Pr,Ba,Ca)MnO3 and (La,Sr)MnO3. Materials Research Society Symposium - Proceedings, 574, 341-346.