Dry etching to form submicron features in CMR oxides

(Pr,Ba,Ca)MnO 3 and (La,Sr)MnO 3

K. P. Lee, K. B. Jung, H. Cho, D. Kumar, S. V. Pietambaram, R. K. Singh, P. H. Hogan, K. H. Dahmen, Y. B. Hahn, S. J. Pearton

Research output: Chapter in Book/Report/Conference proceedingChapter

Abstract

Effective pattern transfer into (Pr,Ba,Ca)MnO3 and (La,Sr)MnO3 has been achieved using Cl2/Ar discharges operated under Inductively Coupled Plasma conditions. Etch rates up to 900 A-min"1 for (La,Sr)MnO3 and 300 A-min'1 for (Pr,Ba,Ca)MnOj were obtained, with these rates being a strong function of ion flux, ion energy and ion-to-neutral ratio. The etching is still physically-dominated under all conditions, leading to significant surface smoothing on initially rough samples. Sub-micron (0.35 Um) features have been produced in both materials using SiN, as the mask.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium - Proceedings
Pages341-346
Number of pages6
Volume574
Publication statusPublished - 1999
Externally publishedYes

Fingerprint

Dry etching
Oxides
Ions
Inductively coupled plasma
Masks
Etching
Fluxes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Lee, K. P., Jung, K. B., Cho, H., Kumar, D., Pietambaram, S. V., Singh, R. K., ... Pearton, S. J. (1999). Dry etching to form submicron features in CMR oxides: (Pr,Ba,Ca)MnO 3 and (La,Sr)MnO 3. In Materials Research Society Symposium - Proceedings (Vol. 574, pp. 341-346)

Dry etching to form submicron features in CMR oxides : (Pr,Ba,Ca)MnO 3 and (La,Sr)MnO 3. / Lee, K. P.; Jung, K. B.; Cho, H.; Kumar, D.; Pietambaram, S. V.; Singh, R. K.; Hogan, P. H.; Dahmen, K. H.; Hahn, Y. B.; Pearton, S. J.

Materials Research Society Symposium - Proceedings. Vol. 574 1999. p. 341-346.

Research output: Chapter in Book/Report/Conference proceedingChapter

Lee, KP, Jung, KB, Cho, H, Kumar, D, Pietambaram, SV, Singh, RK, Hogan, PH, Dahmen, KH, Hahn, YB & Pearton, SJ 1999, Dry etching to form submicron features in CMR oxides: (Pr,Ba,Ca)MnO 3 and (La,Sr)MnO 3. in Materials Research Society Symposium - Proceedings. vol. 574, pp. 341-346.
Lee KP, Jung KB, Cho H, Kumar D, Pietambaram SV, Singh RK et al. Dry etching to form submicron features in CMR oxides: (Pr,Ba,Ca)MnO 3 and (La,Sr)MnO 3. In Materials Research Society Symposium - Proceedings. Vol. 574. 1999. p. 341-346
Lee, K. P. ; Jung, K. B. ; Cho, H. ; Kumar, D. ; Pietambaram, S. V. ; Singh, R. K. ; Hogan, P. H. ; Dahmen, K. H. ; Hahn, Y. B. ; Pearton, S. J. / Dry etching to form submicron features in CMR oxides : (Pr,Ba,Ca)MnO 3 and (La,Sr)MnO 3. Materials Research Society Symposium - Proceedings. Vol. 574 1999. pp. 341-346
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abstract = "Effective pattern transfer into (Pr,Ba,Ca)MnO3 and (La,Sr)MnO3 has been achieved using Cl2/Ar discharges operated under Inductively Coupled Plasma conditions. Etch rates up to 900 A-min{"}1 for (La,Sr)MnO3 and 300 A-min'1 for (Pr,Ba,Ca)MnOj were obtained, with these rates being a strong function of ion flux, ion energy and ion-to-neutral ratio. The etching is still physically-dominated under all conditions, leading to significant surface smoothing on initially rough samples. Sub-micron (0.35 Um) features have been produced in both materials using SiN, as the mask.",
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AU - Jung, K. B.

AU - Cho, H.

AU - Kumar, D.

AU - Pietambaram, S. V.

AU - Singh, R. K.

AU - Hogan, P. H.

AU - Dahmen, K. H.

AU - Hahn, Y. B.

AU - Pearton, S. J.

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