Development of cavity ring-down ellipsometry with spectral and submicrosecond time resolution

Vassilis Papadakis, Michael A. Everest, Katerina Stamataki, Stelios Tzortzakis, Benoit Loppinet, T. Peter Rakitzis

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Cavity-enhanced ellipsometry, using nanosecond pulsed lasers and without moving parts, is demonstrated to have submicrosecond time resolution. The ellipsometric phase angles are measured from the Fourier transform of the cavity ring-down experimental signals, with a sensitivity 0.01 degrees. The technique is applied to highly reflective surfaces, including total internal reflection, where the samples are placed within the evanescent wave. The technique can be generalized to broadband sources, such as from supercontinuum generation, allowing spectral resolution of thin films and monolayer samples.

Original languageEnglish
Title of host publicationInstrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors V
DOIs
Publication statusPublished - 11 Oct 2011
EventInstrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors V - San Diego, CA, United States
Duration: 24 Aug 201125 Aug 2011

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8105
ISSN (Print)0277-786X

Other

OtherInstrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors V
CountryUnited States
CitySan Diego, CA
Period24/8/1125/8/11

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Keywords

  • Cavity Ring Down
  • Ellipsometry
  • Evanescent wave

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Papadakis, V., Everest, M. A., Stamataki, K., Tzortzakis, S., Loppinet, B., & Rakitzis, T. P. (2011). Development of cavity ring-down ellipsometry with spectral and submicrosecond time resolution. In Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors V [81050L] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8105). https://doi.org/10.1117/12.903053