Deposition of amorphous titanium oxide films using alkoxy(pyrazolylborate)titanium(IV) compounds

Elisabeth Charlotte Plappert, Klaus Hermann Dahmen, Roland Hauert, Karl Heinz Ernst

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12 Citations (Scopus)

Abstract

ClTi(OiPr)3 reacts with Na[HB(R3R4R5pz)3] (where pz denotes pyrazolyl) to yield volatile isopropoxy(pyrazolylborate)titanium(IV) compounds. Methoxy- and tert-butoxy(pyrazolylborate)titanium(IV) complexes were isolated from the reaction of hydrido(trispyrazolylborate)trichlorotitanate with the sodium alcoholate. Using [HB(pz)3Ti(OiPr)3], thin amorphous TiO2 films were grown by metal organic chemical vapor deposition (MOCVD) in a low pressure reactor, in the temperature range 250-600 °C. The dependence of the growth on evaporation rate, oxygen flow, and substrate temperature is discussed. The influence of different co-reactants on texture and composition of the film, i.e., O2, N2, H2, and O2 with MeOH, was also investigated. The films were characterized by UV-vis and IR spectroscopy, X-ray diffraction (XRD), Auger electron spectroscopy (AES), and X-ray photoelectron spectroscopy (XPS).

Original languageEnglish
Pages (from-to)79-85
Number of pages7
JournalChemical Vapor Deposition
Volume5
Issue number2
Publication statusPublished - 1 Mar 1999
Externally publishedYes

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Keywords

  • Amorphous materials
  • MOCVD
  • Pyrazolylborate
  • Thin films
  • Titanium dioxide

ASJC Scopus subject areas

  • Process Chemistry and Technology
  • Electrochemistry
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Plappert, E. C., Dahmen, K. H., Hauert, R., & Ernst, K. H. (1999). Deposition of amorphous titanium oxide films using alkoxy(pyrazolylborate)titanium(IV) compounds. Chemical Vapor Deposition, 5(2), 79-85.