Deposition of amorphous titanium oxide films using alkoxy(pyrazolylborate)titanium(IV) compounds

Elisabeth Charlotte Plappert, Klaus Hermann Dahmen, Roland Hauert, Karl Heinz Ernst

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

ClTi(OiPr)3 reacts with Na[HB(R3R4R5pz)3] (where pz denotes pyrazolyl) to yield volatile isopropoxy(pyrazolylborate)titanium(IV) compounds. Methoxy- and tert-butoxy(pyrazolylborate)titanium(IV) complexes were isolated from the reaction of hydrido(trispyrazolylborate)trichlorotitanate with the sodium alcoholate. Using [HB(pz)3Ti(OiPr)3], thin amorphous TiO2 films were grown by metal organic chemical vapor deposition (MOCVD) in a low pressure reactor, in the temperature range 250-600 °C. The dependence of the growth on evaporation rate, oxygen flow, and substrate temperature is discussed. The influence of different co-reactants on texture and composition of the film, i.e., O2, N2, H2, and O2 with MeOH, was also investigated. The films were characterized by UV-vis and IR spectroscopy, X-ray diffraction (XRD), Auger electron spectroscopy (AES), and X-ray photoelectron spectroscopy (XPS).

Original languageEnglish
Pages (from-to)79-85
Number of pages7
JournalChemical Vapor Deposition
Volume5
Issue number2
Publication statusPublished - 1 Mar 1999
Externally publishedYes

Fingerprint

Titanium compounds
Titanium oxides
titanium oxides
Oxide films
oxide films
titanium
Organic Chemicals
Organic chemicals
Amorphous films
Auger electron spectroscopy
Titanium
Ultraviolet spectroscopy
Chemical vapor deposition
Infrared spectroscopy
Evaporation
X ray photoelectron spectroscopy
evaporation rate
Textures
Metals
Sodium

Keywords

  • Amorphous materials
  • MOCVD
  • Pyrazolylborate
  • Thin films
  • Titanium dioxide

ASJC Scopus subject areas

  • Process Chemistry and Technology
  • Electrochemistry
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Plappert, E. C., Dahmen, K. H., Hauert, R., & Ernst, K. H. (1999). Deposition of amorphous titanium oxide films using alkoxy(pyrazolylborate)titanium(IV) compounds. Chemical Vapor Deposition, 5(2), 79-85.

Deposition of amorphous titanium oxide films using alkoxy(pyrazolylborate)titanium(IV) compounds. / Plappert, Elisabeth Charlotte; Dahmen, Klaus Hermann; Hauert, Roland; Ernst, Karl Heinz.

In: Chemical Vapor Deposition, Vol. 5, No. 2, 01.03.1999, p. 79-85.

Research output: Contribution to journalArticle

Plappert, EC, Dahmen, KH, Hauert, R & Ernst, KH 1999, 'Deposition of amorphous titanium oxide films using alkoxy(pyrazolylborate)titanium(IV) compounds', Chemical Vapor Deposition, vol. 5, no. 2, pp. 79-85.
Plappert, Elisabeth Charlotte ; Dahmen, Klaus Hermann ; Hauert, Roland ; Ernst, Karl Heinz. / Deposition of amorphous titanium oxide films using alkoxy(pyrazolylborate)titanium(IV) compounds. In: Chemical Vapor Deposition. 1999 ; Vol. 5, No. 2. pp. 79-85.
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