Chemical bath deposition of indium sulphide thin films: preparation and characterization

C. D. Lokhande, A. Ennaoui, P. S. Patil, M. Giersig, K. Diesner, M. Muller, H. Tributsch

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Abstract

Indium sulphide (In2S3) thin films have been successfully deposited on different substrates under varying deposition conditions using chemical bath deposition technique. The deposition mechanism of In2S3 thin films from thioacetamide deposition bath has been proposed. Films have been characterized with respect to their crystalline structure, composition, optical and electrical properties by means of X-ray diffraction, TEM, EDAX, optical absorption, TRMC (time resolved microwave conductivity) and RBS. Films on glass substrates were amorphous and on FTO (fluorine doped tin oxide coated) glass substrates were polycrystalline (ε phase). The optical band gap of In2S3 thin film was estimated to be 2.75 eV. The as-deposited films were photoactive as evidenced by TRMC studies. The presence of oxygen in the film was detected by RBS analysis.

Original languageEnglish
Pages (from-to)18-23
Number of pages6
JournalThin Solid Films
Volume340
Issue number1
DOIs
Publication statusPublished - 26 Feb 1999
Externally publishedYes

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ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Lokhande, C. D., Ennaoui, A., Patil, P. S., Giersig, M., Diesner, K., Muller, M., & Tributsch, H. (1999). Chemical bath deposition of indium sulphide thin films: preparation and characterization. Thin Solid Films, 340(1), 18-23. https://doi.org/10.1016/S0040-6090(98)00980-8