Abstract
Cupric oxide (CuO) films were deposited on MgO (1 0 0) substrates by two different pulsed laser deposition (PLD) configurations, molecular gas background and RF-plasma assisted, at temperatures over 250-450 °C range. The films were characterized by X-ray diffraction (XRD), reflection of high energy electron diffraction (RHEED), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), ellipsometery, and four probe conductivity measurements. The heating temperature was found to have a limited effect on the structural properties of the films grown in RF-plasma assisted background while it has a significant effect in the case of the standard gas background. The structural observations revealed that RF-plasma background increased the possibility of Frank-van der Merwe or the initial stages of Stranski-Krastanov growth mode, leaving the CuO films highly textured in (1 1 1) direction, atomically smooth and chemically stoichiometric. Optoelectronic properties of best obtained CuO film are presented as well.
| Original language | English |
|---|---|
| Pages (from-to) | 7-12 |
| Number of pages | 6 |
| Journal | Applied Surface Science |
| Volume | 276 |
| DOIs | |
| Publication status | Published - 1 Jul 2013 |
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Keywords
- Background
- CuO/MgO
- Optoelectronic
- PLD
- Pulsed laser deposition
- Thin film
ASJC Scopus subject areas
- Surfaces, Coatings and Films
Cite this
Characterization of CuO(1 1 1)/MgO(1 0 0) films grown under two different PLD backgrounds. / Kawwam, M.; Alharbi, Fahhad; Kayed, T.; Aldwayyan, A.; Alyamani, A.; Tabet, Nouar; Lebbou, K.
In: Applied Surface Science, Vol. 276, 01.07.2013, p. 7-12.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Characterization of CuO(1 1 1)/MgO(1 0 0) films grown under two different PLD backgrounds
AU - Kawwam, M.
AU - Alharbi, Fahhad
AU - Kayed, T.
AU - Aldwayyan, A.
AU - Alyamani, A.
AU - Tabet, Nouar
AU - Lebbou, K.
PY - 2013/7/1
Y1 - 2013/7/1
N2 - Cupric oxide (CuO) films were deposited on MgO (1 0 0) substrates by two different pulsed laser deposition (PLD) configurations, molecular gas background and RF-plasma assisted, at temperatures over 250-450 °C range. The films were characterized by X-ray diffraction (XRD), reflection of high energy electron diffraction (RHEED), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), ellipsometery, and four probe conductivity measurements. The heating temperature was found to have a limited effect on the structural properties of the films grown in RF-plasma assisted background while it has a significant effect in the case of the standard gas background. The structural observations revealed that RF-plasma background increased the possibility of Frank-van der Merwe or the initial stages of Stranski-Krastanov growth mode, leaving the CuO films highly textured in (1 1 1) direction, atomically smooth and chemically stoichiometric. Optoelectronic properties of best obtained CuO film are presented as well.
AB - Cupric oxide (CuO) films were deposited on MgO (1 0 0) substrates by two different pulsed laser deposition (PLD) configurations, molecular gas background and RF-plasma assisted, at temperatures over 250-450 °C range. The films were characterized by X-ray diffraction (XRD), reflection of high energy electron diffraction (RHEED), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), ellipsometery, and four probe conductivity measurements. The heating temperature was found to have a limited effect on the structural properties of the films grown in RF-plasma assisted background while it has a significant effect in the case of the standard gas background. The structural observations revealed that RF-plasma background increased the possibility of Frank-van der Merwe or the initial stages of Stranski-Krastanov growth mode, leaving the CuO films highly textured in (1 1 1) direction, atomically smooth and chemically stoichiometric. Optoelectronic properties of best obtained CuO film are presented as well.
KW - Background
KW - CuO/MgO
KW - Optoelectronic
KW - PLD
KW - Pulsed laser deposition
KW - Thin film
UR - http://www.scopus.com/inward/record.url?scp=84877575482&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84877575482&partnerID=8YFLogxK
U2 - 10.1016/j.apsusc.2013.02.051
DO - 10.1016/j.apsusc.2013.02.051
M3 - Article
AN - SCOPUS:84877575482
VL - 276
SP - 7
EP - 12
JO - Applied Surface Science
JF - Applied Surface Science
SN - 0169-4332
ER -