Characterization of CuO(1 1 1)/MgO(1 0 0) films grown under two different PLD backgrounds

M. Kawwam, Fahhad Alharbi, T. Kayed, A. Aldwayyan, A. Alyamani, Nouar Tabet, K. Lebbou

Research output: Contribution to journalArticle

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Abstract

Cupric oxide (CuO) films were deposited on MgO (1 0 0) substrates by two different pulsed laser deposition (PLD) configurations, molecular gas background and RF-plasma assisted, at temperatures over 250-450 °C range. The films were characterized by X-ray diffraction (XRD), reflection of high energy electron diffraction (RHEED), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), ellipsometery, and four probe conductivity measurements. The heating temperature was found to have a limited effect on the structural properties of the films grown in RF-plasma assisted background while it has a significant effect in the case of the standard gas background. The structural observations revealed that RF-plasma background increased the possibility of Frank-van der Merwe or the initial stages of Stranski-Krastanov growth mode, leaving the CuO films highly textured in (1 1 1) direction, atomically smooth and chemically stoichiometric. Optoelectronic properties of best obtained CuO film are presented as well.

Original languageEnglish
Pages (from-to)7-12
Number of pages6
JournalApplied Surface Science
Volume276
DOIs
Publication statusPublished - 1 Jul 2013

Fingerprint

Pulsed laser deposition
Oxide films
Plasmas
Oxides
Gases
High energy electron diffraction
Optoelectronic devices
Structural properties
Atomic force microscopy
X ray photoelectron spectroscopy
Heating
X ray diffraction
Temperature
Substrates
cupric oxide

Keywords

  • Background
  • CuO/MgO
  • Optoelectronic
  • PLD
  • Pulsed laser deposition
  • Thin film

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

Cite this

Characterization of CuO(1 1 1)/MgO(1 0 0) films grown under two different PLD backgrounds. / Kawwam, M.; Alharbi, Fahhad; Kayed, T.; Aldwayyan, A.; Alyamani, A.; Tabet, Nouar; Lebbou, K.

In: Applied Surface Science, Vol. 276, 01.07.2013, p. 7-12.

Research output: Contribution to journalArticle

Kawwam, M. ; Alharbi, Fahhad ; Kayed, T. ; Aldwayyan, A. ; Alyamani, A. ; Tabet, Nouar ; Lebbou, K. / Characterization of CuO(1 1 1)/MgO(1 0 0) films grown under two different PLD backgrounds. In: Applied Surface Science. 2013 ; Vol. 276. pp. 7-12.
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AB - Cupric oxide (CuO) films were deposited on MgO (1 0 0) substrates by two different pulsed laser deposition (PLD) configurations, molecular gas background and RF-plasma assisted, at temperatures over 250-450 °C range. The films were characterized by X-ray diffraction (XRD), reflection of high energy electron diffraction (RHEED), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), ellipsometery, and four probe conductivity measurements. The heating temperature was found to have a limited effect on the structural properties of the films grown in RF-plasma assisted background while it has a significant effect in the case of the standard gas background. The structural observations revealed that RF-plasma background increased the possibility of Frank-van der Merwe or the initial stages of Stranski-Krastanov growth mode, leaving the CuO films highly textured in (1 1 1) direction, atomically smooth and chemically stoichiometric. Optoelectronic properties of best obtained CuO film are presented as well.

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