Characterization of CuO(1 1 1)/MgO(1 0 0) films grown under two different PLD backgrounds

M. Kawwam; F. H. Alharbi; T. Kayed; A. Aldwayyan; A. Alyamani; N. Tabet; K. Lebbou

doi:10.1016/j.apsusc.2013.02.051

Characterization of CuO(1 1 1)/MgO(1 0 0) films grown under two different PLD backgrounds

M. Kawwam, F. H. Alharbi, T. Kayed, A. Aldwayyan, A. Alyamani, N. Tabet, K. Lebbou

Research output: Contribution to journal › Article

12 Citations (Scopus)

Abstract

Cupric oxide (CuO) films were deposited on MgO (1 0 0) substrates by two different pulsed laser deposition (PLD) configurations, molecular gas background and RF-plasma assisted, at temperatures over 250-450 °C range. The films were characterized by X-ray diffraction (XRD), reflection of high energy electron diffraction (RHEED), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), ellipsometery, and four probe conductivity measurements. The heating temperature was found to have a limited effect on the structural properties of the films grown in RF-plasma assisted background while it has a significant effect in the case of the standard gas background. The structural observations revealed that RF-plasma background increased the possibility of Frank-van der Merwe or the initial stages of Stranski-Krastanov growth mode, leaving the CuO films highly textured in (1 1 1) direction, atomically smooth and chemically stoichiometric. Optoelectronic properties of best obtained CuO film are presented as well.

Original language	English
Pages (from-to)	7-12
Number of pages	6
Journal	Applied Surface Science
Volume	276
DOIs	https://doi.org/10.1016/j.apsusc.2013.02.051
Publication status	Published - 1 Jul 2013

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Keywords

Background
CuO/MgO
Optoelectronic
PLD
Pulsed laser deposition
Thin film

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Physics and Astronomy(all)
Surfaces and Interfaces
Surfaces, Coatings and Films

Cite this

Kawwam, M., Alharbi, F. H., Kayed, T., Aldwayyan, A., Alyamani, A., Tabet, N., & Lebbou, K. (2013). Characterization of CuO(1 1 1)/MgO(1 0 0) films grown under two different PLD backgrounds. Applied Surface Science, 276, 7-12. https://doi.org/10.1016/j.apsusc.2013.02.051

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abstract = "Cupric oxide (CuO) films were deposited on MgO (1 0 0) substrates by two different pulsed laser deposition (PLD) configurations, molecular gas background and RF-plasma assisted, at temperatures over 250-450 °C range. The films were characterized by X-ray diffraction (XRD), reflection of high energy electron diffraction (RHEED), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), ellipsometery, and four probe conductivity measurements. The heating temperature was found to have a limited effect on the structural properties of the films grown in RF-plasma assisted background while it has a significant effect in the case of the standard gas background. The structural observations revealed that RF-plasma background increased the possibility of Frank-van der Merwe or the initial stages of Stranski-Krastanov growth mode, leaving the CuO films highly textured in (1 1 1) direction, atomically smooth and chemically stoichiometric. Optoelectronic properties of best obtained CuO film are presented as well.",

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AU - Kawwam, M.

AU - Alharbi, F. H.

AU - Kayed, T.

AU - Aldwayyan, A.

AU - Alyamani, A.

AU - Tabet, N.

AU - Lebbou, K.

PY - 2013/7/1

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N2 - Cupric oxide (CuO) films were deposited on MgO (1 0 0) substrates by two different pulsed laser deposition (PLD) configurations, molecular gas background and RF-plasma assisted, at temperatures over 250-450 °C range. The films were characterized by X-ray diffraction (XRD), reflection of high energy electron diffraction (RHEED), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), ellipsometery, and four probe conductivity measurements. The heating temperature was found to have a limited effect on the structural properties of the films grown in RF-plasma assisted background while it has a significant effect in the case of the standard gas background. The structural observations revealed that RF-plasma background increased the possibility of Frank-van der Merwe or the initial stages of Stranski-Krastanov growth mode, leaving the CuO films highly textured in (1 1 1) direction, atomically smooth and chemically stoichiometric. Optoelectronic properties of best obtained CuO film are presented as well.

AB - Cupric oxide (CuO) films were deposited on MgO (1 0 0) substrates by two different pulsed laser deposition (PLD) configurations, molecular gas background and RF-plasma assisted, at temperatures over 250-450 °C range. The films were characterized by X-ray diffraction (XRD), reflection of high energy electron diffraction (RHEED), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), ellipsometery, and four probe conductivity measurements. The heating temperature was found to have a limited effect on the structural properties of the films grown in RF-plasma assisted background while it has a significant effect in the case of the standard gas background. The structural observations revealed that RF-plasma background increased the possibility of Frank-van der Merwe or the initial stages of Stranski-Krastanov growth mode, leaving the CuO films highly textured in (1 1 1) direction, atomically smooth and chemically stoichiometric. Optoelectronic properties of best obtained CuO film are presented as well.

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KW - Optoelectronic

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KW - Pulsed laser deposition

KW - Thin film

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Access to Document

10.1016/j.apsusc.2013.02.051