Characterization of CuO(1 1 1)/MgO(1 0 0) films grown under two different PLD backgrounds

M. Kawwam, F. H. Alharbi, T. Kayed, A. Aldwayyan, A. Alyamani, N. Tabet, K. Lebbou

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12 Citations (Scopus)


Cupric oxide (CuO) films were deposited on MgO (1 0 0) substrates by two different pulsed laser deposition (PLD) configurations, molecular gas background and RF-plasma assisted, at temperatures over 250-450 °C range. The films were characterized by X-ray diffraction (XRD), reflection of high energy electron diffraction (RHEED), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), ellipsometery, and four probe conductivity measurements. The heating temperature was found to have a limited effect on the structural properties of the films grown in RF-plasma assisted background while it has a significant effect in the case of the standard gas background. The structural observations revealed that RF-plasma background increased the possibility of Frank-van der Merwe or the initial stages of Stranski-Krastanov growth mode, leaving the CuO films highly textured in (1 1 1) direction, atomically smooth and chemically stoichiometric. Optoelectronic properties of best obtained CuO film are presented as well.

Original languageEnglish
Pages (from-to)7-12
Number of pages6
JournalApplied Surface Science
Publication statusPublished - 1 Jul 2013



  • Background
  • CuO/MgO
  • Optoelectronic
  • PLD
  • Pulsed laser deposition
  • Thin film

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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