Application of UV-sulfite advanced reduction process to bromate removal

Venkata Sai Vamsi Botlaguduru, Bill Batchelor, Ahmed Abdel-Wahab

Research output: Contribution to journalArticle

28 Citations (Scopus)

Abstract

Bromate is a possible human carcinogen regulated in drinking water at a maximum contaminant level (MCL) of 10μg/L. This research applied an advanced reduction process (ARP) that combined sulfite (SO3 2-) as a reducing agent and UV as the activating method to remove bromate. In addition to photolysis, this UV-sulfite ARP generates sulfite anion radicals (SO3 -) and aqueous electrons (eaq -) that react with and reduce the target bromate. Results from batch experiments showed pseudo first-order removal of bromate with rate constants (Kobs) varying from 0.015 to 2.11min-1. The effect of process variables like sulfite dose, pH and UV characteristics on the kinetics were studied. The reduction kinetics improved with increasing sulfite doses and UV intensities. Acidic pH resulted in decreased kinetics, with pH above 7, resulting in the highest observed rate constants. Two different UV wavelengths, 222nm and 254nm were used to activate sulfite in solution. Lower wavelength UV resulted in kinetics two orders of magnitude higher than UV at 254nm. Quantum yields for this ARP were calculated to be in the range of 0.016-0.036mol/Einstein. The principal reduction end products were bromide and sulfate, with recovery of bromide ranging from 80% to 90%. The overall results indicate a promising application potential for ARPs in the removal of disinfection byproducts in water.

Original languageEnglish
Pages (from-to)76-82
Number of pages7
JournalJournal of Water Process Engineering
Volume5
DOIs
Publication statusPublished - 1 Apr 2015
Externally publishedYes

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Keywords

  • Advanced reduction
  • Aqueous electron
  • Bromate
  • Disinfection byproducts
  • Quantum yield
  • Sulfite
  • UV

ASJC Scopus subject areas

  • Biotechnology
  • Safety, Risk, Reliability and Quality
  • Waste Management and Disposal
  • Process Chemistry and Technology

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